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{{short description|Micro projection technology}}
The '''grating light valve''' ('''GLV''') is a "micro projection" technology
<!-- Image with unknown copyright status removed: [[Image:6ribbons GLV.JPG|300 px|thumb|Figure1: The GLV Device with alternate ribbons deflected to form a dynamic diffraction grating]] -->
Silicon Light Machines (SLM), in Sunnyvale CA, markets and licenses GLV technology with the capitalised trademarks
==Brief history==
The light valve was
In July 2000, [[Sony]] announced the signing of a technology licensing agreement with SLM<ref>[http://www.sony.net/SonyInfo/News/Press_Archive/200206/02-023E/ Sony Develops a Grating Light Valve display device that gives high resolution, excellent contrast ratio and wide color reproduction]</ref><ref>
SLM then partnered with [[Evans & Sutherland]] (E&S). Using GLV technology, E&S developed the E&S Laser Projector, designed for use in domes and planetariums.<ref>
== Technology ==
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<!-- Image with unknown copyright status removed: [[Image:Different wavelength deflection.gif|thumb|500 px|Figure2:example of application of different wavelength deflection]] -->
The GLV device is built on a silicon [[wafer]] and consists of parallel rows of
The ribbons and the substrate are electrically conductive so that the [[Electrostatic deflection (structural element)|deflection]] of the ribbon can be controlled in an analog manner: When the voltage of the active ribbons is set to ground potential, all ribbons are undeflected, and the device acts as a mirror so the incident light returns along the same path. When a voltage is applied between the ribbon and base conductor, an electrical field is generated and deflects the active ribbon downward toward the substrate. This deflection can be as big as one-quarter wavelength hence creating diffraction effects on incident light that is reflected at an angle that is different from that of the incident light. The wavelength to diffract is determined by the spatial frequency of the ribbons. As this spatial frequency is determined by the photolithographic mask used to form the GLV device in the [[CMOS]] fabrication process, the departure angles can be very accurately controlled, which is useful for optical switching applications.
Switching from undeflected to maximum ribbon deflection can occur in 20 nanoseconds, which is a million times faster than conventional [[LCD]] display devices
== Applications ==
The GLV technology has been applied to
<!-- Image with unknown copyright status removed: [[Image:GLV optical system.JPG|thumb|400 px|Figure3: HDTV application]] -->
=== Displays ===
To build a display system using the GLV device, different approaches can be followed: ranging from a simple
Besides, the light can be diffracted by the GLV device into an eyepiece for [[virtual retinal display]]
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=== Computer to plate printing ===
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==See also==
* [[Digital Light Processing|DLP]]
* [[Liquid crystal on silicon]]
== References ==
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== External links ==
* [http://www.siliconlight.com Silicon Light Machines]
* [http://www.screen.co.jp/index.html Dainippon Screen Manufacturing Co., Ltd.]
* [http://www.sony.net/SonyInfo/News/Press_Archive/200206/02-023E/ Sony]
* [http://www.es.com Evans & Sutherland]
* [https://web.archive.org/web/20080705223522/http://www.meko.co.uk/glv.shtml MEKO-European Display Data and Market Research]
* [http://www.hdtvexpert.com HDTVExpert]
* [
{{DEFAULTSORT:Grating Light Valve}}
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