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{{short description|Micro projection technology}}
The
<!-- Image with unknown copyright status removed: [[Image:6ribbons GLV.JPG|300 px|thumb|Figure1: The GLV Device with alternate ribbons deflected to form a dynamic diffraction grating]] -->
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<!-- Image with unknown copyright status removed: [[Image:Different wavelength deflection.gif|thumb|500 px|Figure2:example of application of different wavelength deflection]] -->
The GLV device is built on a silicon [[wafer]] and consists of parallel rows of "'highly reflective micro-ribbons'" – ribbons of sizes of a few
The ribbons and the substrate are electrically conductive so that the [[Electrostatic deflection (structural element)|deflection]] of the ribbon can be controlled in an analog manner: When the voltage of the active ribbons is set to ground potential, all ribbons are undeflected, and the device acts as a mirror so the incident light returns along the same path. When a voltage is applied between the ribbon and base conductor, an electrical field is generated and deflects the active ribbon downward toward the substrate. This deflection can be as big as one-quarter wavelength hence creating diffraction effects on incident light that is reflected at an angle that is different from that of the incident light. The wavelength to diffract is determined by the spatial frequency of the ribbons. As this spatial frequency is determined by the photolithographic mask used to form the GLV device in the [[CMOS]] fabrication process, the departure angles can be very accurately controlled, which is useful for optical switching applications.
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