| Display title | Photoresist |
| Default sort key | Photoresist |
| Page length (in bytes) | 29,419 |
| Namespace ID | 0 |
| Page ID | 23781 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of page watchers | 81 |
| Number of page watchers who visited in the last 30 days | 3 |
| Number of redirects to this page | 6 |
| Counted as a content page | Yes |
| Wikidata item ID | Q1439684 |
| Local description | Light-sensitive material used in making electronics |
| Central description | light-sensitive material used in photolithography and photoengraving |
| Page image |  |
| Page views in the past 30 days | |
| Edit | Allow all users (no expiry set) |
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| Page creator | Conversion script (talk | contribs) |
| Date of page creation | 15:43, 25 February 2002 |
| Latest editor | 171.76.87.141 (talk) |
| Date of latest edit | 09:35, 4 June 2024 |
| Total number of edits | 391 |
| Recent number of edits (within past 30 days) | 1 |
| Recent number of distinct authors | 1 |
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