Zhang et al., 2007 - Google Patents
Cleaning using CO2‐based solventsZhang et al., 2007
- Document ID
- 7591542314260792094
- Author
- Zhang X
- Han B
- Publication year
- Publication venue
- CLEAN–Soil, Air, Water
External Links
Snippet
Cleaning with hierarchy of CO2‐based solvents is advantageous from an environmental point of view because CO2 is non‐flammable, virtually inert, and abundant. After cleaning, the only waste stuffs generated are the contaminants that are removed from the cleaned …
- 238000004140 cleaning 0 title abstract description 102
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6905555B2 (en) | Methods for transferring supercritical fluids in microelectronic and other industrial processes | |
| US7044143B2 (en) | Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems | |
| Zhang et al. | Cleaning using CO2‐based solvents | |
| KR100400194B1 (en) | Supercritical Drying Method and Supercritical Drying Apparatus | |
| US20020179126A1 (en) | Methods for the control of contaminants following carbon dioxide cleaning of microelectronic structures | |
| Zhang et al. | Water-in-carbon dioxide microemulsions for removing post-etch residues from patterned porous low-k dielectrics | |
| US6562146B1 (en) | Processes for cleaning and drying microelectronic structures using liquid or supercritical carbon dioxide | |
| US6766670B2 (en) | Non-aqueous washing cabinet and apparatus | |
| KR100482496B1 (en) | Process and apparatus for removing residues from the microstructure of an object | |
| US20020112740A1 (en) | Methods for cleaning microelectronic structures with aqueous carbon dioxide systems | |
| TW200300974A (en) | Method of high pressure treatment | |
| Keagy et al. | Cleaning of patterned porous low-k dielectrics with water, carbon dioxide and ambidextrous surfactants | |
| Aronson | Influence of hydrophobic particles on the foaming of aqueous surfactant solutions | |
| KR20030075185A (en) | Methods for cleaning microelectronic structures | |
| JP3920738B2 (en) | Drying method of fine structure | |
| Verma et al. | Relationship between oil–water interfacial tension and oily soil removal in mixed surfactant systems | |
| Zhang et al. | Chemical-mechanical photoresist drying in supercritical carbon dioxide with hydrocarbon surfactants | |
| JP2004158534A (en) | Method for cleaning microscopic structure | |
| JP3982791B2 (en) | High pressure processing equipment | |
| JP3553856B2 (en) | Supercritical drying method | |
| JP2004186530A (en) | Cleaning apparatus and cleaning method | |
| JP3553838B2 (en) | Supercritical drying method | |
| Vidrine et al. | Emulsions in porous media. I. Transport and stability of polyaphrons in sand packs | |
| Polat et al. | Kinetics of oil dispersion in the absence and presence of block copolymers | |
| Zhang et al. | Supercritical CO2-based solvents in next generation microelectronics processing |