CN104191860B - Colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof - Google Patents
Colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof Download PDFInfo
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- CN104191860B CN104191860B CN201410428043.XA CN201410428043A CN104191860B CN 104191860 B CN104191860 B CN 104191860B CN 201410428043 A CN201410428043 A CN 201410428043A CN 104191860 B CN104191860 B CN 104191860B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/342—Moiré effects
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
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Abstract
The invention discloses a kind of colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof, moir é pattern thin film includes transparent substrate layer, is positioned at the micro-lens arrays layer of transparent substrate layer side and is positioned at the micrographics array layer of transparent substrate layer opposite side, described micro-lens arrays layer includes the lenticule of some array arrangements, described micrographics array layer includes some set array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches。The moir é pattern that moir é pattern thin film of the present invention is formed has colour, dynamically and the characteristic of solid, and observer is under any luminous environment, it is not necessary to special Observational Techniques is just it is observed that color three dimension motion graphics。
Description
Technical field
The present invention relates to public's optical visual safety anti-fake technical field, particularly relate to a kind of colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof。
Background technology
In prior art, the main Techniques of Optical Security used is divided three classes: the public is false proof, professional false proof and three lines are false proof。False proof main employing of the public forms main scape pattern, multichannel and dynamic technique。Specialty is false proof mostly adopts thumbnail image and word, is clearly discernible with the high magnified glass of automatic light source。Three lines are false proof is mainly diffraction element and various coding techniques etc.。Wherein, public's anti-counterfeiting technology is characterized as being in the normal state, not by any instrument, with the naked eye or sensory organ can Direct Recognition feature, the most easily distinguish for broad masses of the people, therefore particularly important。It should have two fundamentals: readily identified and be difficult to forge。
In public's anti-counterfeiting technology, the Techniques of Optical Security being currently used for label, banknote, the credit card etc. refers mainly to diffraction light change image DOVID (DiffractiveOpticallyVariableImageDevices), it comprises the hologram image known by people, including pixel hologram, dot matrix hologram and dynamic moire figure etc. that Later development gets up。Well-known product such as a kind of DOVID technology of France's HologramIndustries company development in recent years, is characterized in that image resolution ratio is 600LPI, but the diffraction element resolution of trickle word and lines can reach 6000LPI, and brightness of image is high, bright in luster。The optical grating construction of diffraction identification technology is that its screen periods is less than 0.4 μm (embossed holographic screen periods is generally 1 μm) by the Zurich laboratory invention of PaulScherrer institute of Switzerland。It is red when horizontal level observes image (or word)；When image is planar turned 90 °, then observe bottle green。Machine-readable reliability is high and equipment price is low。But being as the holographic extensive use in fields such as ticket, trade mark, packagings, many producers are provided with the ability producing holographic product so that laser hologram has been absorbed in trust crisis。
Therefore, people need searching to meet technology height, the popular technology of cost a new generation low, easy to identify, arbitral urgently。Such as forth generation laser in combination hologram technology, the two dimensional image that even hundreds of is different by tens is by tens holograies that even hundreds of time exposure records, by each side of objective and over time process record get off, namely this hologram can not only record the three dimensions (X with reconstructed object, Y, Z) characteristic, moreover it is possible to record and reproduce the change of this three-dimensional body (T) in time。Make this hologram reference object is not limited, it is necessary to tens even hundreds of frame two dimensional image be recorded, thus exposure frequency is tens even hundred times of common holography, this needs special instrument and equipment and more exquisite technical process to realize。Also just like the G-switch technology of SecurencyPTY company of Australia, by making special optical layers, it is achieved observing from direction is certain color, looking up from orthogonal side is the complementary color of this color, without Special Training and instrument。Only in, in one second to several seconds, just differentiating by easy method。It addition, people also invented safety line and windowing technology thereof, develop skill threshold further, and safety line is the wire mark that the thin-film material worked is made。
Also having a class noticeable a new generation technology is More's amplifying technique microlens array (Microlensarray, MLA) and micrographics array (Micropatternarray, MPA) being implemented in combination with。More's amplification relates to a kind of phenomenon, can produce this phenomenon, namely occur with the amplification of micrographics or rotated versions when observing, from the microlens array with roughly the same periods dimension, the array being made up of identical micrographics。More amplifies phenomenon ultimate principle in M.C.Hutley, R.Hunt, R.F.StevensandP.Savander, PureAppl.Opt.3 (1994), described by having in pp.133～142。Drinkwater etc. take the lead in proposing the safety device being combined by hemispherical dimpling lens arra with micrographics array in U.S. Patent No. 5,712,731。Micrographics is near the back focal plane of dimpling lens, and human eye is observed it can be seen that More's intensified image of micrographics at lenticule convex side, and wherein dimpling aperture of lens is at 50～250 microns, and micrographics array is obtained by the mode of intaglio printing, and minimum resolution is 5 microns。The drawback of ultrathin (thickness is less than 50 microns) device is made in order to overcome above-mentioned patent to be unfavorable for, in U.S. Patent No. 2005/0180020Al and later patents No.2008/0037131Al, R.A.Steenblik etc. have further expanded the safety device scope made according to above-mentioned micro-optic principle, as dimpling aperture of lens is decreased to 20～30 microns, focal length is less than 50 microns, space layer is less than 50 microns, micrographics layer has changeable complicated arrangement, can be transparent, translucent, fluorescence, phosphorescence, dye, optically variable pigments etc., and propose some structures based on reflective mode operation etc.。Chinese patent safety element (application number 200680048634.8) proposes a kind of predefined curved Bravias lattice structure。By designing microlens array and micrographics array and permutation and combination thereof, it is possible to realize multiple visual effect: 1) micrographics amplifies: namely originally invisible micrographics be amplified to can by direct visual perception；2) orthogonal movement: when namely rocking along certain direction, it was observed that grand design move along direction normal thereto；3) third dimension: the grand design observed has emersion or depression in the stereoeffect of paper；4) motion deformation: the grand design observed in moving process it may also happen that the change of size, shape etc.。More's amplifying technique both can individually realize the above-mentioned several visual effects to micrographics, the combination of above-mentioned several visual effect can also be realized simultaneously, as a kind of line technology very easily distinguished for naked eyes and look, it can not be that digital image, scanning, duplicating, printing equipment etc. replicate。
U.S. patents and patent applications US5712731, US2005/0180020A1 and US2008/0037131A1 propose dimpling lens arra and micrographics array are conjointly employed in safety device, micrographics array therein is that the mode by intaglio printing obtains, and minimum resolution is 5 microns。Main manufacture method is, coating photoresist on the fexible films such as PET, is the deep groove of a few micrometers with the relief printing plate with micro-picture and text in the photoresist surface imprint degree of depth, by blade coating mode, ink is inserted groove so that the corresponding color of micro-picture and text showing。In this micro-diagram text manufacture method, the color of image is obtained by Fill Color ink in a groove, and micro-picture and text color is single, it is impossible to forms colorization and shows；Micro-picture and text characteristic size is a few micrometers, and general printing-ink granule is tens microns, and therefore, the nanoscale ink needing special facture could as Fill Color ink；So that abundant ink is received in groove, improving the contrast between micro-picture and text and background, depth of groove will be greater than 3 microns。Need to make big depth-to-width ratio embossed metal template, when large format dynamic image makes, improve its technology difficulty。
Therefore, for above-mentioned technical problem, it is necessary to provide a kind of colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof。
Summary of the invention
In view of this, in order to solve described the problems of the prior art, the invention provides a kind of colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof。
To achieve these goals, the technical scheme that the embodiment of the present invention provides is as follows:
A kind of colored dynamic solid moir é pattern thin film based on micro-printing, described moir é pattern thin film includes transparent substrate layer, is positioned at the micro-lens arrays layer of transparent substrate layer side and is positioned at the micrographics array layer of transparent substrate layer opposite side, described micro-lens arrays layer includes the lenticule of some array arrangements, described micrographics array layer includes some set array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches。
As a further improvement on the present invention, described micro-lens arrays layer and micrographics array layer are quadrate array arrangement mode or hexagonal array mode。
As a further improvement on the present invention, in described micrographics array layer, the overall dimensions of micrographics is 10 μm～100 μm, and live width is 1 μm～20 μm。
As a further improvement on the present invention, the amplification of described moir é pattern thin film is:
Wherein, the period ratio of microlens array and micrographics array is r, and angle each other is θ。
As a further improvement on the present invention, when the period ratio r of described microlens array and micrographics array is 1, the amplification of described moir é pattern thin film is:
As a further improvement on the present invention, the cycle that the moir é pattern that described moir é pattern thin film is formed moves is:
Wherein, the cycle of microlens array is a, and the cycle of micrographics array is b, and the distance between microlens array and micrographics is h, and the viewing angle of offset from perpendicular is Ф。
Correspondingly, the preparation method of a kind of colored dynamic solid moir é pattern thin film based on micro-printing, described method includes:
S1, provide a transparent substrate layer；
S2, preparing micro-lens arrays layer in transparent substrate layer side, described micro-lens arrays layer includes the lenticule of some array arrangements；
S3, preparing micrographics array layer at transparent substrate layer opposite side, described micrographics array layer includes some set array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches。
As a further improvement on the present invention, described step S3 particularly as follows:
Metal mask version is positioned in transparent substrate layer, and is directed at, metal mask version includes the hollow out micrographics structure of some array arrangements；
Ink is poured in one end of metal mask version, with scraper plate at the ink position of metal mask version applying certain pressure, moving towards the metal mask version other end, ink is expressed to transparent substrate layer by scraper plate from hollow out micrographics structure in movement simultaneously, forms the micrographics of array arrangement；
Repeat the above steps, forms some set array arrangements in transparent substrate layer and has the micrographics of different colours。
As a further improvement on the present invention, described metal mask version preparation method particularly as follows:
Even application photoresist or photoetching dry film on the metallic substrate；
By laser direct-writing or photomask exposure, after development, form relief type micrographics structure；
By metal plating technique, form metal deposition layer on the surface of the show-through current-carrying part of metal substrate；
Remove photoresist, and metal deposition layer is separated metal substrate, form the metal mask version with hollow out micrographics structure。
As a further improvement on the present invention, the thickness of described metal mask version is 5um～100um。
As a further improvement on the present invention, the material of described metal mask version is Ni, Cu, Ni-Co alloy or Fe-Ni alloy/C。
As a further improvement on the present invention, described metal mask version is provided with alignment mark, transparent substrate layer and metal mask version and adopts CCD or machinery set bit alignment。
The method have the advantages that
The moir é pattern that moir é pattern thin film is formed has colour, dynamically and the characteristic of solid, remain horizontal disparity and vertical parallax simultaneously, color three dimension dynamic image clearly can be demonstrated, the effect of identification is not only provided, also the manufacture difficulty of anti-fake product be will be further increased simultaneously, make observer under any luminous environment, it is not necessary to special Observational Techniques is just it is observed that color three dimension motion graphics。
Moir é pattern film preparation is convenient, and micrographics printing cost is low and resolution is high；Metal mask version is easy to make。
Accompanying drawing explanation
In order to be illustrated more clearly that the embodiment of the present invention or technical scheme of the prior art, the accompanying drawing used required in embodiment or description of the prior art will be briefly described below, apparently, the accompanying drawing that the following describes is only some embodiments recorded in the present invention, for those of ordinary skill in the art, under the premise not paying creative work, it is also possible to obtain other accompanying drawing according to these accompanying drawings。
Fig. 1 is the structural representation of moir é pattern thin film in a detailed description of the invention in the present invention；
The structural representation of micrographics array layer and microlens array in Fig. 2 a, 2b respectively embodiment of the invention；
Fig. 3 a～3f is the preparation method process chart of moir é pattern thin film in the embodiment of the invention；
The structural representation of the first metal mask version and the second metal mask version in Fig. 4 a, 4b respectively embodiment of the invention；
Fig. 5 a～5d is the preparation method process chart of metal mask version in the embodiment of the invention。
Detailed description of the invention
Describe the present invention below with reference to detailed description of the invention shown in the drawings。But these embodiments are not limiting as the present invention, those of ordinary skill in the art is all contained in protection scope of the present invention according to the made structure of these embodiments, method or conversion functionally。
The invention discloses a kind of colored dynamic solid moir é pattern thin film based on micro-printing, including transparent substrate layer, it is positioned at the micro-lens arrays layer of transparent substrate layer side and is positioned at the micrographics array layer of transparent substrate layer opposite side, micro-lens arrays layer includes the lenticule of some array arrangements, micrographics array layer includes some set array arrangements and has the micrographics of different colours, and the array arrangement of lenticular array arrangement and micrographics matches。
As shown in Figure 1, in a detailed description of the invention of the present invention, moir é pattern thin film includes transparent substrate layer 1, micro-lens arrays layer 2 and micrographics array layer 3, wherein, micro-lens arrays layer includes the lenticule 21 of some array arrangements, micrographics array layer includes the first micrographics 31 and the second micrographics 32 of some array arrangements, and the first micrographics 31 and the second micrographics 32 have different colors。
The moir é pattern that in present embodiment, moir é pattern thin film is formed not only has solid, dynamic effect, moreover it is possible to realize colorization, below moir é pattern thin film is described in detail。
The moir é pattern thin film of lenticule micrographics combination remains horizontal disparity and vertical parallax simultaneously, it is ensured that viewing angle is big so that observer is under any luminous environment, it is not necessary to special Observational Techniques is just it is observed that three-dimensional colour figure。Showing 3-D view clearly, lenticule have to strictly mate and closely sealed with micrographics, and the color of micrographics is not limited to two sets in other embodiments。
In present embodiment, the structure of micrographics and lenticular structure match。The arrangement mode of micro lens array layer has two kinds, i.e. square arrangement mode or hexagonal array mode。The array arrangement of micrographics is corresponding with the arrangement of corresponding microlens array。
In present embodiment, the amplification of moir é pattern thin film is:
Wherein, the period ratio of microlens array and micrographics array is r, and angle each other is θ。
In micrographics array layer, the overall dimensions of micrographics is 10 μm～100 μm, and live width is 1 μm～20 μm。According to above-mentioned formula, micrographics array amplifies through microlens array, and pattern visual evoked potentials rate M is 20～∞。As r=1, the computing formula of pattern visual evoked potentials rate is
When θ=0.1 °, it it is 573 times according to above-mentioned formula graphic amplification M。Preferably, micrographics height is 5 μm～100 μm, if micrographics height 20um, then the feature size after More's amplification is 11.45mm, and namely people's bore hole can recognize that。
When having certain distance between microlens array and micrographics array, owing to viewing angle change can cause the movement of micrographics array。Assume that the microlens array cycle is a, micrographics array period is b, distance between microlens array and micrographics is h (thickness of transparent substrate layer), the cycle of More's enlarged drawing picture is L, during with offset from perpendicular Ф for viewing angle, the cycle that the moir é pattern that moir é pattern thin film is formed moves is:
The dynamic effect of moir é pattern, when cycle of images is more big, the spacing h of lenticule and micrographics is more big, and the cycle of micrographics array is more little, and dynamic effect is more good。Moir é pattern has two kinds of dynamic effects:
1) if micrographics array is identical with the orientation of microlens array, the arrangement cycle is different, and observer's change of perspective then can be appreciated that the direction that More's enlarged drawing picture innervation direction is moved with observer is identical or contrary。
2) if micrographics array is identical with the lenticule cycle, but between have a little angle theta, when eyes vertically move, moir é pattern transverse shifting, when eyes transverse shifting, moir é pattern vertically moves。
Stereoeffect is that visual disparity during owing to observing is formed。When the micrographics cycle less than the lenticule cycle time, produce figure sink effect, when the micrographics cycle more than the lenticule cycle time, produce figure float effect, these float sink More's enlarged drawing pictures namely form 3-D effect。
The respectively structural representation of micrographics array layer and microlens array in the embodiment of the invention shown in ginseng Fig. 2 a, 2b。In micrographics array layer, the first micrographics 31 is the sun micrographics with the first color and array arrangement, and the second micrographics 32 is the crescent moon micrographics with the second color and array arrangement, and micro-lens arrays layer 2 includes some lenticulees 21 with respective array arrangement。
The sun micrographics with the first color and the crescent moon micrographics overall dimensions with the second color are 10 μm～100 μm, and live width is 1 μm～20 μm。According to above-mentioned formula, micrographics array amplifies through microlens array, it is possible to use naked eye。
In the present invention, the preparation method of moir é pattern thin film specifically includes:
S1, provide a transparent substrate layer；
S2, preparing micro-lens arrays layer in transparent substrate layer side, described micro-lens arrays layer includes the lenticule of some array arrangements；
S3, preparing micrographics array layer at transparent substrate layer opposite side, described micrographics array layer includes some set array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches。
Wherein step S3 particularly as follows:
Metal mask version is positioned in transparent substrate layer, and is directed at, metal mask version includes the hollow out micrographics structure of some array arrangements；
Ink is poured in one end of metal mask version, with scraper plate at the ink position of metal mask version applying certain pressure, moving towards the metal mask version other end, ink is expressed to transparent substrate layer by scraper plate from hollow out micrographics structure in movement simultaneously, forms the micrographics of array arrangement；
Repeat the above steps, forms some set array arrangements in transparent substrate layer and has the micrographics of different colours。
Shown in Fig. 3 a～3f, the preparation method of moir é pattern thin film in the specific embodiment of the invention is described in detail。
First, it is provided that a transparent substrate layer 1, prepare the lenticule 21 of array arrangement in transparent substrate layer side, form micro-lens arrays layer。
Utilizing the metal mask version saturating ink of micrographics part, the ultimate principle of non-micrographics part not strike through is printed。
Shown in ginseng Fig. 3 a, the first metal mask version 41 is positioned in transparent substrate layer 1, and is directed at, the first metal mask version 41 includes the first hollow out micrographics structure of some array arrangements；
Shown in ginseng Fig. 3 a, 3b, first ink 51 with the first color is poured in one end of the first metal mask version 41, certain pressure is applied at the first ink position of the first metal mask version with scraper plate 6, moving towards first metal mask version 41 other end, the first ink 51 is expressed to transparent substrate layer 1 from the first hollow out micrographics structure by scraper plate 6 in movement simultaneously。Make trace set due to the viscous effect of ink within limits, printing process middle scraper 6 all the time with the first metal mask version 41 and transparent substrate layer 1 in linear contact lay。
When scraper plate 6 lifted after scraping the whole space of a whole page, the first metal mask version is also lifted simultaneously, and the first ink 51 is gently scraped back initial position, can form the first micrographics 31 of the array arrangement shown in Fig. 3 c。
Similarly, shown in ginseng Fig. 3 d～3f, by the second micrographics 32 of the second metal mask version 42, second ink 52 with the second color and the equally possible formation array arrangement of scraper plate 6, its print principle is identical with the print principle of the first micrographics, no longer repeats at this。With the first micrographics the difference is that, the first metal mask version 41 is placed for being close to transparent substrate layer 1, and the second metal mask version 42 for be close to first micrographics place, distance transparent substrate layer 1 has certain distance。
Ginseng Fig. 4 a, 4b show in the embodiment of the invention to have the first metal mask version 41 of sun micrographics and have the structural representation of the second metal mask version 42 of crescent moon micrographics。Micrographics can also be that other figures or word or its combine in other embodiments。
In Fig. 4 a, 4b, black part is divided into barrier bed, and micrographics is openwork part。The overall dimensions of openwork part is 5um～100um, and live width is 0.5 μm～20 μm。The thickness of metal mask version 5 μm～100 μm, and metal mask version has cross alignment mark, for realizing accurate para-position in post-production。
During printing micrographics, by the cross alignment mark in the first metal mask version and the second metal mask version, adopt CCD or machinery set bit alignment, thus realizing the colored micrographics array with higher contrast。
Metal mask version in the present invention adopts metal deposit growth method, concretely comprises the following steps:
Shown in ginseng Fig. 5 a, even application photoresist or photoetching dry film 402 in metal substrate 401, photoresist can be negativity or positivity, and thickness is 5um～100um；
By laser direct-writing or photomask exposure, after development, form the relief type micrographics structure shown in Fig. 5 b；
Shown in ginseng Fig. 5 c, by metal plating technique, form metal deposition layer 403 on the surface of the show-through current-carrying part of metal substrate 401；
Remove photoresist or photoetching dry film, and metal deposition layer 403 is separated metal substrate 401, the metal mask version with hollow out micrographics structure shown in Fig. 5 d can be formed。
The graphics resolution of laser direct-write photoetching system is up to 0.2um-0.5um, and therefore, the present invention can realize the micrographics exposure of more than 1um live width。Therefore, the micrographics live width of above-mentioned metal mask plate is up to 1 micron, and overall dimensions can reach 10 microns。Preferably, the thickness 5um-100um of metal mask plate in the present embodiment, material is Ni, Cu, Ni-Co alloy or Fe-Ni alloy/C。
The present invention can be applied in anti-counterfeiting technology, and novel anti-counterfeiting technology visually requires: colour, innervation, multidimensional, multichannel and layered effect。
If making colored micrographics with traditional mode of printing, for the top imaging system JetScreen2000 of the large format silk screen of Luscher company and offset plate, it has the ink jet printing head that 256 nozzles are constituted, it is possible to provide the output of 700dpi image in different resolution；AutoprintSrl. the subsidiary Amanda of company releases novel thermal ink jet printer DigitAll, it may be achieved the image in different resolution output of 720 × 720dpi；In numeral silk screen printing, the novel ultra-wide breadth Grandjet printer resolution of Scitex is 370 × 370dpi；The Fresco printer of Nur company can reach the resolution of 720dpi。Therefore, with the technical merit printed at present or print, the micrographics that can not realize high accuracy (site error is less than 1%) and high-resolution (10 μm) makes, realize, thus not having, the precision that More amplifies, and the printing type of poor efficiency also is difficult to realize the mass of micrographics, low-cost production。
Compared with prior art, the method have the advantages that
The moir é pattern that moir é pattern thin film is formed has colour, dynamically and the characteristic of solid, remain horizontal disparity and vertical parallax simultaneously, color three dimension dynamic image clearly can be demonstrated, the effect of identification is not only provided, also the manufacture difficulty of anti-fake product be will be further increased simultaneously, make observer under any luminous environment, it is not necessary to special Observational Techniques is just it is observed that color three dimension motion graphics。
Moir é pattern film preparation is convenient, and micrographics printing cost is low and resolution is high (micrographics overall dimensions 5um～100um, live width 0.5 μm～20 μm)；Metal mask version is easy to make。
It is obvious to a person skilled in the art that the invention is not restricted to the details of above-mentioned one exemplary embodiment, and when without departing substantially from the spirit of the present invention or basic feature, it is possible to realize the present invention in other specific forms。Therefore, no matter from which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the invention rather than described above limits, it is intended that all changes in the implication of the equivalency dropping on claim and scope included in the present invention。Any accompanying drawing labelling in claim should be considered as the claim that restriction is involved。
In addition, it is to be understood that, although this specification is been described by according to embodiment, but not each embodiment only comprises an independent technical scheme, this narrating mode of description is only for clarity sake, description should be made as a whole by those skilled in the art, and the technical scheme in each embodiment through appropriately combined, can also form other embodiments that it will be appreciated by those skilled in the art that。
Claims (11)
1. the preparation method based on the colored dynamic solid moir é pattern thin film of micro-printing, it is characterized in that, described moir é pattern thin film includes transparent substrate layer, is positioned at the micro-lens arrays layer of transparent substrate layer side and is positioned at the micrographics array layer of transparent substrate layer opposite side, described micro-lens arrays layer includes the lenticule of some array arrangements, described micrographics array layer includes some set array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches；
Described method includes:
S1, provide a transparent substrate layer；
S2, preparing micro-lens arrays layer in transparent substrate layer side, described micro-lens arrays layer includes the lenticule of some array arrangements；
S3, preparing micrographics array layer at transparent substrate layer opposite side, described micrographics array layer includes some set array arrangements and has the micrographics of different colours, and the array arrangement of described lenticular array arrangement and micrographics matches, step S3 particularly as follows:
Metal mask version is positioned in transparent substrate layer, and is directed at, metal mask version includes the hollow out micrographics structure of some array arrangements；
Ink is poured in one end of metal mask version, with scraper plate at the ink position of metal mask version applying certain pressure, moving towards the metal mask version other end, ink is expressed to transparent substrate layer by scraper plate from hollow out micrographics structure in movement simultaneously, forms the micrographics of array arrangement；
Repeat the above steps, forms some set array arrangements in transparent substrate layer and has the micrographics of different colours。
2. preparation method according to claim 1, it is characterised in that the preparation method of described metal mask version particularly as follows:
Even application photoresist or photoetching dry film on the metallic substrate；
By laser direct-writing or photomask exposure, after development, form relief type micrographics structure；
By metal plating technique, form metal deposition layer on the surface of the show-through current-carrying part of metal substrate；
Remove photoresist, and metal deposition layer is separated metal substrate, form the metal mask version with hollow out micrographics structure。
3. preparation method according to claim 2, it is characterised in that the thickness of described metal mask version is 5um～100um。
4. preparation method according to claim 2, it is characterised in that the material of described metal mask version is Ni, Cu, Ni-Co alloy or Fe-Ni alloy/C。
5. preparation method according to claim 1, it is characterised in that be provided with alignment mark, transparent substrate layer and metal mask version in described metal mask version and adopt CCD or machinery set bit alignment。
6. the colored dynamic solid moir é pattern thin film based on micro-printing, it is characterized in that, the preparation method based on the colored dynamic solid moir é pattern thin film of micro-printing described in any one of claim 1-5 is adopted to prepare, described moir é pattern thin film includes transparent substrate layer, it is positioned at the micro-lens arrays layer of transparent substrate layer side, and it is positioned at the micrographics array layer of transparent substrate layer opposite side, described micro-lens arrays layer includes the lenticule of some array arrangements, described micrographics array layer includes some set array arrangements and has the micrographics of different colours, the array arrangement of described lenticular array arrangement and micrographics matches。
7. moir é pattern thin film according to claim 6, it is characterised in that described micro-lens arrays layer and micrographics array layer are quadrate array arrangement mode or hexagonal array mode。
8. moir é pattern thin film according to claim 6, it is characterised in that in described micrographics array layer, the overall dimensions of micrographics is 10 μm～100 μm, live width is 1 μm～20 μm。
9. moir é pattern thin film according to claim 6, it is characterised in that the amplification of described moir é pattern thin film is:
Wherein, the period ratio of microlens array and micrographics array is r, and angle each other is θ。
10. moir é pattern thin film according to claim 9, it is characterised in that when the period ratio r of described microlens array and micrographics array is 1, the amplification of described moir é pattern thin film is:
11. moir é pattern thin film according to claim 6, it is characterised in that the cycle that the moir é pattern that described moir é pattern thin film is formed moves is:
Wherein, the cycle of microlens array is a, and the cycle of micrographics array is b, and the distance between microlens array and micrographics is h, and the viewing angle of offset from perpendicular is Ф。
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410428043.XA CN104191860B (en) | 2014-08-27 | 2014-08-27 | Colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof |
| PCT/CN2015/075480 WO2016029692A1 (en) | 2014-08-27 | 2015-03-31 | Coloured dynamic stereoscopic moire image thin film based on micro printing and preparation method therefor |
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| CN201410428043.XA CN104191860B (en) | 2014-08-27 | 2014-08-27 | Colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof |
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| CN104191860B true CN104191860B (en) | 2016-06-22 |
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| CN104191860B (en) * | 2014-08-27 | 2016-06-22 | 苏州大学 | Colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof |
| CN104614790B (en) * | 2015-03-03 | 2016-06-22 | 苏州苏大维格光电科技股份有限公司 | Planar Fresnel lens arra dynamically amplifies blooming |
| CN104965254A (en) * | 2015-07-30 | 2015-10-07 | 上海宏盾防伪材料有限公司 | Dynamic 3D holographic element and manufacturing method therefor |
| MA43350A (en) * | 2015-10-02 | 2018-08-08 | De La Rue Int Ltd | SECURITY DEVICE |
| CN105730058B (en) * | 2016-02-03 | 2019-06-18 | 中国人民银行印制科学技术研究所 | A kind of anti-counterfeiting product and preparation method thereof |
| CN105929550A (en) * | 2016-05-20 | 2016-09-07 | 深圳市裕同包装科技股份有限公司 | Naked-eye three-dimensional printing product and manufacturing method thereof |
| CN105842859A (en) * | 2016-05-20 | 2016-08-10 | 深圳市裕同包装科技股份有限公司 | Naked-eye stereoscopic print and manufacture method thereof |
| GB201612290D0 (en) * | 2016-07-15 | 2016-08-31 | La Rue Int De Ltd | Methods of manufacturing a secuirty device |
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| CN108828700A (en) * | 2018-07-18 | 2018-11-16 | 中国科学院光电技术研究所 | Preparation method of dynamic pattern capable of moving along certain direction based on micro-lens array and micro-pattern array |
| CN111830726B (en) * | 2019-04-19 | 2023-03-17 | 昇印光电（昆山）股份有限公司 | 3D imaging film |
| CN112505939A (en) * | 2019-08-26 | 2021-03-16 | 昇印光电（昆山）股份有限公司 | Imaging optical film and decorative film |
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| CN114475044B (en) * | 2020-11-11 | 2023-03-10 | 中钞特种防伪科技有限公司 | Optical anti-counterfeiting element, manufacturing method thereof and anti-counterfeiting product |
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| WO2024087010A1 (en) * | 2022-10-25 | 2024-05-02 | 华为技术有限公司 | Three-dimensional image and text structure, image and text apparatus, and terminal device |
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| CN103333549B (en) * | 2013-06-07 | 2014-11-26 | 中国人民银行印制科学技术研究所 | Water-based ink, and preparation method and safe product thereof |
| CN103333544B (en) * | 2013-06-07 | 2014-11-26 | 中国人民银行印制科学技术研究所 | Ultraviolet curing printing ink as well as preparation method and security product thereof |
| CN104191860B (en) * | 2014-08-27 | 2016-06-22 | 苏州大学 | Colored dynamic solid moir é pattern thin film based on micro-printing and preparation method thereof |
-
2014
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| WO2016029692A1 (en) | 2016-03-03 |
| CN104191860A (en) | 2014-12-10 |
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