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JPS54150082A - Method of drawing pattern with electron beam - Google Patents

Method of drawing pattern with electron beam

Info

Publication number
JPS54150082A
JPS54150082A JP5906778A JP5906778A JPS54150082A JP S54150082 A JPS54150082 A JP S54150082A JP 5906778 A JP5906778 A JP 5906778A JP 5906778 A JP5906778 A JP 5906778A JP S54150082 A JPS54150082 A JP S54150082A
Authority
JP
Japan
Prior art keywords
electron beam
drawing pattern
pattern
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5906778A
Other languages
Japanese (ja)
Inventor
Katsuhiro Kawabuchi
Shigeharu Horiuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP5906778A priority Critical patent/JPS54150082A/en
Publication of JPS54150082A publication Critical patent/JPS54150082A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
JP5906778A 1978-05-18 1978-05-18 Method of drawing pattern with electron beam Pending JPS54150082A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5906778A JPS54150082A (en) 1978-05-18 1978-05-18 Method of drawing pattern with electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5906778A JPS54150082A (en) 1978-05-18 1978-05-18 Method of drawing pattern with electron beam

Publications (1)

Publication Number Publication Date
JPS54150082A true JPS54150082A (en) 1979-11-24

Family

ID=13102626

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5906778A Pending JPS54150082A (en) 1978-05-18 1978-05-18 Method of drawing pattern with electron beam

Country Status (1)

Country Link
JP (1) JPS54150082A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0458104A (en) * 1990-06-27 1992-02-25 Hitachi Ltd Electron beam size measuring instrument
JP2005032838A (en) * 2003-07-08 2005-02-03 Canon Inc Method and device for charged particle beam lithography and method of manufacturing device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0458104A (en) * 1990-06-27 1992-02-25 Hitachi Ltd Electron beam size measuring instrument
JP2005032838A (en) * 2003-07-08 2005-02-03 Canon Inc Method and device for charged particle beam lithography and method of manufacturing device
JP4494734B2 (en) * 2003-07-08 2010-06-30 キヤノン株式会社 Charged particle beam drawing method, charged particle beam exposure apparatus, and device manufacturing method

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