KR101416629B1 - Manufacturing method of articles having fine pattern, and articles manufactured by the same - Google Patents

Abstract

The present invention relates to a method of manufacturing a product having a fine pattern, and a method of manufacturing a plate-shaped product, which can simplify the process and solve the problem of the conventional process defects, and can reduce the defect rate, reduce the cost, and improve the production yield There is a main purpose in this. It is another object of the present invention to provide a method of forming a functional multi-layered fine pattern which is suitable for producing a low-cost product at a low production cost and provides a robust and versatile visual effect. In order to accomplish the above object, the present invention provides a method of manufacturing a semiconductor device, which comprises applying a light-reactive resin on a substrate, irradiating a selected region of the photoreactive resin coated on the substrate with light, Wherein a fine pattern is formed in the resin layer on the substrate by a difference in transparency by causing a difference in transparency between the portions of the substrate that are not covered with the substrate.

Description

Technical Field [0001] The present invention relates to a method of manufacturing a product having a fine pattern, and a product manufactured thereby,

The present invention relates to a method of manufacturing a product having a fine pattern, which can simplify the process and reduce the defect rate, reduce the cost, and improve the production yield.

As a conventional method for forming a fine pattern on the surface of a substrate, a film having fine patterns is directly formed by using a mold in which a nano or micro pattern is processed, or a film mold is produced using a master mold, Type mold to form a fine pattern on the surface of the substrate.

Here, the method using the film-type mold has an advantage that the life of the master mold can be extended.

Prior art documents related to such a process include Published Documents 10-2009-0030932 and 10-0601264.

1 is a view showing a conventional method of forming a fine pattern, which shows a thermal forming method using a mold.

As shown in the figure, the molding resin 2 on the surface of the substrate 1 is heated to a predetermined temperature by using the mold 3 having the fine pattern formed thereon, and a fine pattern is formed by applying pressure.

2 is a view showing another conventional method for forming a fine pattern, which shows a method of forming an ultraviolet ray using a mold.

As shown in the figure, the UV-curable resin 5 is uniformly coated on the mold 4 having the fine pattern formed thereon, the transparent substrate 6 is covered with the UV-curable resin 5, And ultraviolet rays are irradiated toward the cured resin 5 side.

At this time, the ultraviolet curable resin 5 is cured by ultraviolet rays transmitted through the transparent substrate 6, and a fine pattern is formed on the resin 5 molded by the mold 4 and cured by ultraviolet rays, It is possible to manufacture a product in which a fine pattern is formed on the surface of the transparent substrate 6.

3 is a view showing another conventional method of forming a fine pattern, which shows a photolithography process using a photomask and a photosensitizer.

As shown in the figure, the photoresist 8 is uniformly applied on the substrate 7, and the portion exposed by the photomask 9 is separated from the portion not exposed to the photoresist 8 on the surface of the substrate 7 Thereby selectively forming the desired fine pattern on the substrate 7. [

At this time, a positive photoresist may be used to remove the photoresist portion of the exposed region on the substrate surface, or a negative photoresist may be used to remove the unexposed portion.

However, the method using the above-described mold is complicated in the mold making process, and the process defects that occur in the molding process become a problem.

Particularly, in manufacturing a mold (or a stamp) for transferring a micro or nano scale pattern to a substrate, a complicated pattern requires a large amount of cost to manufacture a mold, and in the process of forming a fine pattern using such a mold, There is a problem in that a large number of defects occur and production yield is low.

In addition, when a fine pattern of a multi-layer structure is formed, a very weak product structure is obtained.

In addition, high-yield products such as semiconductors and displays are produced by applying a photolithography process. However, since such a process has a high process cost such as exposure, development, and cleaning, it is applied to low-cost products such as film products It is not suitable for the following reasons, and it has a weak structure especially when a pattern of a multi-layer structure is formed.

SUMMARY OF THE INVENTION Accordingly, the present invention has been made in order to solve the above-mentioned problems, and it is an object of the present invention to provide a product having a fine pattern, which can simplify the process, solve the conventional process defects problem, And a method for producing the same.

Another object of the present invention is to provide a method for forming a functional multi-layered fine pattern which is suitable for producing a low cost product at a low production cost and which provides a robust and various visual effect.

It is still another object of the present invention to provide a method for manufacturing a functional product having a fine pattern usable as an exterior material, an exterior part, or a display part of a product such as a mobile phone or a portable PC.

In order to accomplish the above object, the present invention provides a method of manufacturing a semiconductor device, which comprises applying a light-reactive resin on a substrate, irradiating a selected region of the photoreactive resin coated on the substrate with light, And a difference in transparency of a part of the substrate which is not covered with the transparent substrate is caused to occur, thereby forming a fine pattern which is distinguished by the difference in transparency inside the resin layer on the substrate.

Here, in order to allow light to be irradiated only to a selected region of the photoreactive resin, a selective light transmitting member having a patterned through region through which light passes is placed on the resin coated on the substrate, And the light focused by the lens is directly irradiated to a desired resin portion.

And a photomask or nano stencil is used as the light transmitting member.

And the light is any one of ultraviolet ray, laser, and electron beam.

The substrate may be a polymer substrate, a glass substrate, a ceramic substrate, or a metal substrate.

Also, by repeating a process of applying a photoreactive resin on the resin layer and irradiating light to cause a difference in transparency between the light-irradiated portion and the non-light-irradiated portion, a resin layer having a fine pattern therein is formed on the substrate Or more.

And a color reproduction layer having a color between the substrate and the resin layer on which the fine pattern is formed.

The color developing layer may be formed using an ink containing a dye, or may be formed by depositing a thin film of a metal, an oxide, a carbide, or a nitride.

And a pattern layer having a concavo-convex structure having a nano or micro pattern is formed between the substrate and the color reproduction layer or between the color reproduction layer and the resin layer having the fine pattern formed thereon.

And a pattern layer having a concave-convex structure of nano or micro pattern is laminated between the substrate and the resin layer in which the fine pattern is formed.

In addition, the substrate is a transparent substrate of a polymer material or a transparent substrate used as a window part for a display attached to a display window.

And an inner fingerprint film is laminated on the surface of the outermost resin layer having the fine pattern so as to have an inner fingerprint function.

Accordingly, in the method of manufacturing a product having a fine pattern according to the present invention, light is irradiated onto a selected portion of a photoreactive resin applied on a substrate to produce a difference in transparency between the light-receiving resin portion and the non- It is possible to produce a fine pattern, and at the same time, it is possible to achieve low-cost production while eliminating the problem of the conventional process defects, and it is possible to reduce the defect rate, reduce the cost, and improve the production yield.

Further, the present invention can easily form fine patterns of a functional multilayer structure that can realize patterns of various shapes, provide robust and various visual effects, and can be combined with various patterns in a multi-layer structure.

In addition, the present invention can be applied not only to a flat substrate but also to a flat substrate having fine patterns formed by using a curved substrate, and to a display film using a transparent film substrate.

In addition, the present invention can be applied to the manufacture of products using various types of substrates such as films, sheets, plates and the like. Such substrate products can be used as high-quality exterior materials or external parts such as mobile phones, portable PCs, Can be usefully used.

Further, the present invention can form a pattern regardless of the type of the substrate, such as film, glass, quartz, other ceramics or metal plates, and in particular, since it is not a method of applying pressure to the substrate, it can form a fine pattern There is an advantage to be able to do.

1 is a view showing a thermal forming method using a mold as a conventional fine pattern forming method.
2 is a view showing a method of forming an ultraviolet ray using a mold as another conventional fine pattern forming method.
3 is a view showing a photolithography process using a photomask and a photosensitive agent as another conventional fine pattern formation method.
4 is a view illustrating a method of forming a fine pattern according to a first embodiment of the present invention.
5 is a view illustrating a method of forming a fine pattern according to a second embodiment of the present invention.
6 is a view illustrating a method of forming a fine pattern according to a third embodiment of the present invention.
7 is a view showing a method of forming a fine pattern according to a fourth embodiment of the present invention.
8 is a view illustrating a method of forming a fine pattern according to a fifth embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings, which will be easily understood by those skilled in the art.

The present invention relates to a method capable of forming a functional fine pattern structure capable of providing a simple and inexpensive production process, capable of reducing defective rate, reducing cost, improving production yield, and providing robust and versatile visual effects .

In the present invention, a fine pattern means a fine pattern including nanoscale or microscale.

A method of forming a resin layer having a fine pattern on a substrate, comprising the steps of: applying a resin that reacts with light on a substrate; irradiating a selected region of the resin coated on the substrate with light; And a difference in transparency between the portions not irradiated with light, thereby forming a fine pattern visually identified by the difference in transparency inside the resin layer on the substrate.

As a method of irradiating a selected portion of the resin with light, a method of irradiating light with a selective light transmitting member having a patterned through region such as a photomask or a nano stencil is placed on the resin, A method of directly irradiating the desired resin part with light focused by a lens or the like can be used.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

FIG. 4 is a view showing a method of forming a fine pattern according to the first embodiment of the present invention, and shows a method of forming a fine pattern using light and a photomask.

As shown in the figure, after the resin 12a which reacts with the light is uniformly applied to the surface of the substrate 11, the selective light transmitting member 13 having the patterned penetration region to be formed is coated with the resin 12a (Not shown).

The selective light transmitting member 13 and the substrate 11 are irradiated with light on the selective light transmitting member 13 using a light irradiating device (not shown) The light receiving resin portion 12b reacts through the through region of the selective light transmitting member 13 in the entire region of the photoreactive resin 12a.

Thus, the resin part 12b reacted by the light of the light irradiation device in the entire resin area, that is, the resin part that receives light through the through area of the selective light transmitting member and the selective light transmitting member 13 (the through area A difference in transparency (transparency) occurs between the resin portions 12a which are shielded by the light and are not received.

Due to such a difference in transparency, the resin portion 12b reacting with light in the entire resin region forms a fine pattern in the resin layer 12 which is apparently distinguished from the remaining resin portion 12a, It is possible to produce a product in which the resin layer 12 having the resin layer 12b and the substrate 11 are laminated.

In the present invention, the substrate 11 may be a plate-shaped substrate having a constant thickness or a partially different thickness, and the thickness of the substrate is not particularly limited at this time.

In addition, a member or a component having a specific shape having a surface on which a fine pattern is to be formed may be used in place of the substrate 11, and a selective light transmitting member of a flexible type, a flexible light selective transmitting member 13, Since the selective light transmitting member can be used, the substrate 11 can also use a substrate of a curved plate as well as a substrate of a flat plate.

That is, a product in which a fine pattern is formed on a curved plate can be manufactured.

Further, it may be a film, a sheet, a plate material or the like depending on the material and the thickness, and may be a flexible substrate or a flexible film.

As the material of the substrate 11, a transparent, semitransparent or opaque substrate may be used, and a polymer substrate such as PET, PC or PMMA may be used. In addition, a glass substrate, quartz, Si, SiO ₂ , TiO ₂ , A ceramic substrate such as ZrO ₂ , Al ₂ O ₃ , SiC, WC, TiN, Si ₃ N ₄ or BN or a metal substrate such as Al, Cu, Ti, W, Ni, Cr, Pt, .

Also, the light irradiated by the light irradiating device may be ultraviolet (UV), laser, electron beam, or the like, and may be one of various known lights used in the lithography process.

In the case of using ultraviolet rays, the ultraviolet ray-reactive resin which reacts with ultraviolet rays is used as the photoreactive resin 12a. In this case, it is possible to use a known ultraviolet ray hardening resin or to control a part of the components of the existing ultraviolet ray hardening resin ) It is possible to use a resin capable of efficiently reacting with ultraviolet rays.

In addition, in the case of using ultraviolet rays, the portion 12b of the ultraviolet reactive resin 12a applied to the surface of the substrate 11 is cured simultaneously with the reaction, and even in the case of the remaining portion 12a which has not received ultraviolet rays, It is possible to natural harden through.

When a laser or an electron beam is used, a laser reaction resin or an electron beam reaction resin is used as the light-responsive resin 12a. The laser reaction resin is applied to the surface of the substrate 11, cured, and then irradiated with light.

At this time, the reaction of the resin by the laser beam and the electron beam is performed by breaking the portion of the cured resin layer 12 exposed by the through region of the selective light transmitting member 13 (reference numeral 14 in FIG. 5) It is a physical reaction of the form.

Using this reaction, it is possible to cause a difference in transparency between a region irradiated with light (exposed region) and a region not irradiated with light (non-exposed region), and a region irradiated with light has transparency The fine pattern 12b due to the difference in transparency can be discretely formed inside the resin layer 12.

Of course, since the resin 12a used in the present invention should be able to react with light locally in response to light or non-exposure to cause difference in transparency, the resin 12a may be a transparent material or a completely transparent material, A material having a light transmittance inherent to the material to some extent (a material having transparency of a certain level or higher such as transparent or translucent) should be used.

The photomask 13 can be used for the selective light transmitting members 13 and 14 when ultraviolet rays and a laser are used and the nanostencil 14 can be used for an electron beam.

Of course, both the photomask 13 and the nano stencil 14 are fabricated to have a fine patterned penetration area. In this specification, the manufacturing of a photomask in which a nano or microscale penetration area is formed, The fabrication of the nanostencils is well known in the art and will not be described in detail.

When the selective light transmitting members 13 and 14 are used as described above, the selective light transmitting member may be disposed apart from the light reactive resin 12a on the substrate 11 at the time of light irradiation, It is possible to arrange them.

In addition, in the present invention, since a selective light transmitting member is placed on a resin and light is irradiated on the resin, no pressure is applied to the substrate, and thus a fine pattern can be formed on a glass substrate which can be easily broken.

In the case of a conventional process, since a fine pattern is formed through contact and pressurization, if a glass substrate having a small thickness is used, it can easily break or cause defects such as cracks in the substrate. For a thin glass substrate, Formation of patterns was impossible or difficult.

On the other hand, in the present invention, since the pressure is not applied to the substrate, the above-described problem can be solved and a fine pattern can be formed on the glass substrate.

When a glass substrate is used as described above, it is possible to use a glass product having a fine pattern formed thereon as a component for external use or display of a mobile phone, a portable PC, a large home appliance, or as a glass for construction such as a lighting or a window.

When a transparent substrate is used, it is possible to use a plate-like product having a fine pattern formed thereon as a window part for display of electric devices such as a mobile phone, a portable PC, a TV, and a PC monitor.

5 shows a method of forming a fine pattern according to a second embodiment of the present invention. This shows a method of forming a fine pattern on the surface of the substrate 11 using the above-described nano stencil and electron beam.

The electron beam reaction resin is uniformly coated on the substrate 11 as the photoreactive resin 12a and then cured to selectively irradiate the resin 12a with a predetermined pattern using the nanostencil 14.

Even in this case, the portion (fine pattern portion) 12b exposed by the electron beam passing through the fine penetration region (nano scale penetration region) of the nanostencil 14 in the finished resin layer 12 and the portion 12a).

This difference in transparency makes it possible to form the fine pattern 12b which can be distinguished in appearance inside the resin layer 12.

In this case, not only the embodiment of FIG. 4 but also the embodiment of FIG. 5, various process conditions such as the amount of light-reactive resin, the amount of light and the intensity of light, which can control the transparency of the exposed resin- The desired fine pattern can be formed in the resin layer.

In describing the illustrated embodiments of Figs. 4 and 5, it is described that a selective light transmitting member of the photomask 13 or the nano stencil 14 is used to irradiate a selected portion of the photoreactive resin 12a with light However, a method of directly irradiating the desired resin portion with the light focused by the focusing lens or the like can also be used.

It is also possible to form a multilayer structure by stacking a plurality of resin layers 12 having fine patterns 12b therein in addition to the single layer structure illustrated in Figs. 4 and 5, Layer structure may be formed on the surface of the substrate 11 when the process is repeated.

6 is a view showing a method of forming a fine pattern according to a third embodiment of the present invention. This is an embodiment in which a color reproduction layer 13 capable of realizing color is additionally formed on a surface of a substrate 11 will be.

This can be applied to the manufacture of high-quality facings or external components in which the color im- plementation layer 13 can be formed between the resin layer 12 with a fine pattern and the surface of the substrate 11, ) Can be formed by a method of printing using all or a part of the surface of the substrate 11 using an ink including a dye or a method of depositing a thin film of metal, oxide, carbide or nitride.

In the case of the above metal, oxide, carbide, nitride, it is possible to use it as a material of a color reproduction layer because it exhibits a unique color when it is formed into a thin film having a thin thickness.

In this case, the metal may be Al, Cu, Ti, W, Ni, Cr, Pt, Au, or Ag. Examples of the oxides include SiO ₂ , TiO ₂ , ZrO ₂ , Al ₂ O ₃ , Nb ₂ O ₅ SiC, WC, SiC or the like is used as the carbide, and TiN, Si ₃ N ₄ , BN or the like is used as the nitride.

As the deposition method, a vacuum deposition method such as sputtering or a known thin film formation method or coating method can be applied.

The method of forming the resin layer 12, that is, the resin layer 12 having the fine pattern 12b, formed on the color rendering layer 13 is the same as the embodiment of FIGS. 4 and 5, (13) are formed first, and then a resin layer is formed by the same method.

Of course, in order to produce a transparent product, the color implementation layer can be omitted as in the embodiment of Figs. 4 and 5.

7 is a view showing a method of forming a fine pattern according to a fourth embodiment of the present invention. The embodiment shown therein is also an embodiment for forming the color reproduction layer 13, which is applicable to the manufacture of a high- Method.

6 in that the resin layer 12 having the fine patterns 12b therein is formed in a multilayer structure as compared with the case of FIG. 6, and the color reproduction layer 13 is formed on the surface of the substrate 11 in the same manner A first resin layer 12 having a fine pattern 12b on the color rendering layer 13 and a second resin layer 12 'having a fine pattern 12b on the first resin layer 12, Respectively.

In forming the first resin layer 12 and the second resin layer 12 ', the same method as in the embodiment of FIG. 4 or 5 may be used, and a fine pattern (not shown) in each resin layer 12, 12' 12b may be all different or partly the same.

In addition, although the resin layer is formed in a two-layer structure of the first and second resin layers in the embodiment illustrated in FIG. 7, the number of laminated layers of the resin layer may be variously changed to three or more. Only a resin layer 12, 12 'of a multilayer structure is formed on the substrate 11 without a color reproduction layer.

8 is a view illustrating a method of forming a fine pattern according to a fifth embodiment of the present invention. The embodiment shown in FIG. 8 is also an embodiment for forming the color reproduction layer 13, This is an applicable method.

8, the color reproduction layer 13, the nano or micro pattern layer 15, and the fine pattern 12b are formed inside the color reproduction layer 13, the nano or micro pattern layer 15, Layer structure including a resin layer 12 having a plurality of openings.

That is, after the color reproduction layer 13 is formed on the surface of the substrate 11, a nano or micro pattern is formed on all or a part of the color reproduction layer 13, The resin layer 12 having the fine pattern 12b is formed as a single layer or multiple layers on the resin layer 15.

At this time, a known method can be used for forming the nano or micro pattern on the color reproduction layer 13. In the case of the nano pattern, the method of forming a nano pattern shown in FIG. 5 of the present invention, that is, A method of forming a nano pattern on the resin layer can be applied.

Alternatively, the nanopattern may be transferred onto the color reproduction layer 13 using a known nanoimprint process.

The pattern of the nano or micropattern layer 15 may have a concavo-convex pattern. In this case, the concave or convex pattern may be a line, a dot (e.g., a dot having a flat upper surface) A prism shape having a triangular cross-sectional shape, a lenticular lens shape (e.g., a shape in which a cross-sectional shape portion having a curved outline is elongated in a specific direction) A green house shape), a spinning shape having a concentric circular structure, and the like.

The method of forming the color reproduction layer 13 on the surface of the substrate 11 and the method of forming the resin layer 12 having the fine pattern 12b may be the same method as described above, It is also possible to form only the nano- or micropatterned layer 15 having a concave-convex structure and the resin layer 12 having the fine pattern 12b in the interior thereof without the above-mentioned color reproduction layer.

Also, the order of stacking the color-rendering layer 13 and the nano- or micropatterned layer 15 of the concave-convex structure may be reversed. That is, the nano- or micropatterned layer 15 of the concave-convex structure may be formed first, It is possible to form the implementation layer 13.

In addition, it is possible to form a nanopattern and a micropattern in a complex pattern in the fine pattern 12b of the resin layer 12 and the nano- or micropatterned layer 15 of the concavo-convex structure, thereby achieving an external fine pattern.

As described above, the plate-shaped product manufactured according to the present invention can be used in various applications besides the above-mentioned applications. For example, a polymer film such as PET or PC may have a single layer or multi- It is possible to apply this film as an in-mold injection film.

In addition, it is possible to apply a plate-like product prepared by using a substrate made of a polymer material to a single layer or a multi-layer structure and then applying an adhesive substance to the rear surface of the substrate, as a functional film attachable to a window of a mobile phone or a portable PC.

At this time, when the fine pattern in the resin layer has a height-to-height ratio of as high as that of a pattern substrate, it can be applied as a security film for personal privacy protection for a portable display.

It is also possible to laminate an inner fingerprint film as an outermost layer on the surface of a resin layer having a fine pattern to give an inner fingerprint function.

The scope of the present invention is not limited to the above-described embodiments, and various modifications and improvements of those skilled in the art using the basic concept of the present invention defined in the following claims are also included in the scope of the present invention.

11: substrate
12a: a photoreactive resin (or a resin part not receiving light)
12b: a fine pattern (or a resin part reacted with light)
13: Photomask (or selective light transmitting member)
14: nano stencil (or selective light transmitting member)
15: nano or micropattern layer

Claims (20)

After the light-responsive resin 12a is applied onto the substrate 11, light is irradiated onto a selected region of the photoreactive resin 12a coated on the substrate 11, (12b) that is visually distinguishable by a difference in transparency within the resin layer (12) on the substrate (11) by causing a difference in transparency between the portions Gt;
The method according to claim 1,
The selective light transmitting members 13 and 14 having the patterned through regions through which the light passes can be formed on the resin 11 coated on the substrate 11 so that the light can be irradiated only on the selected region of the photoreactive resin 12a 12a, and then irradiating light or irradiating the desired resin portion directly with the light focused by the focusing lens.
The method of claim 2,
Wherein the photomask (13) or the nanostencil (14) is used as the light transmitting member.
The method of claim 2,
Wherein the light is one of ultraviolet ray, laser, and electron beam.
The method according to claim 1,
Wherein the substrate (11) is a polymer substrate, a glass substrate, a ceramic substrate, or a metal substrate.
The method according to claim 1,
The photoreactive resin 12a is coated on the resin layer 12 on which the fine pattern 12b is formed and light is irradiated to repeat the process of causing a difference in transparency between a light irradiated portion and a non- Characterized in that a resin layer (12) having fine patterns (12b) therein is formed on the substrate (11) in a multilayer structure of two or more layers.
The method according to claim 1 or 6,
(13) having a color is formed between the substrate (11) and the resin layer (12) on which the fine pattern (12b) is formed.
The method of claim 7,
Wherein the color rendering layer (13) is formed using an ink containing a dye, or formed by depositing a thin film of metal, oxide, carbide, or nitride.
The method of claim 7,
A pattern layer 15 having a nano or micropattern of concavo-convex structure is formed between the substrate 11 and the color reproduction layer 13 or between the color reproduction layer 13 and the resin layer 12 formed with the fine pattern 12b. ) Is laminated on the surface of the substrate.
The method according to claim 1 or 6,
Characterized in that a pattern layer (15) having a concave-convex structure of nano or micro pattern is laminated between the substrate (11) and the resin layer (12) on which the fine pattern (12b) is formed .
The method according to claim 1 or 6,
Wherein the substrate (11) is a transparent substrate used as a polymer material transparent substrate or a window part for display attached to a display window.
The method according to claim 1 or 6,
Wherein an inner fingerprint film is laminated on a surface of an outermost resin layer (12) having the fine pattern (12b) so as to have an inner fingerprint function.
Characterized in that a resin layer (12) having fine patterns (12b) produced by the method of manufacturing the product of claim 1 and which is internally distinguished inside is laminated on the substrate (11) .
14. The method of claim 13,
Another resin layer 12 'having a fine pattern 12b is laminated on the resin layer 12 so that a multilayer structure of two or more layers made of a plurality of resin layers 12 and 12' The resin layer 12 'is formed by applying a photoreactive resin 12a and selectively irradiating light onto the photoreactive resin 12a to form a gap between the light-irradiated portion and the non- Wherein the step of forming the fine pattern is repeatedly performed.
The method according to claim 13 or 14,
Characterized in that a color reproduction layer (13) having a color is interposed between the substrate (11) and the resin layer (12) on which the fine pattern (12b) is formed.
16. The method of claim 15,
Wherein the color rendering layer (13) is formed using an ink containing a dye, or formed by depositing a thin film of a metal, an oxide, a carbide, or a nitride.
16. The method of claim 15,
A pattern layer 15 having a nano or micropattern of concavo-convex structure is formed between the substrate 11 and the color reproduction layer 13 or between the color reproduction layer 13 and the resin layer 12 formed with the fine pattern 12b. ) Is interposed between the substrate and the substrate.
The method according to claim 13 or 14,
Characterized in that a pattern layer (15) having a nano or micropattern of concavo-convex structure is interposed between the substrate (11) and the resin layer (12) on which the fine pattern (12b) is formed.
The method according to claim 13 or 14,
Wherein the substrate (11) is a transparent substrate used as a polymer material transparent substrate or a display window material attached to a display window.
The method according to claim 13 or 14,
Characterized in that an inner fingerprint film is laminated as an outermost layer on the surface of the resin layer (12) having the fine pattern (12b) so as to have an inner fingerprint function.

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