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US20060171152A1 - Light emitting device and method of making the same - Google Patents

Light emitting device and method of making the same Download PDF

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Publication number
US20060171152A1
US20060171152A1 US11/334,745 US33474506A US2006171152A1 US 20060171152 A1 US20060171152 A1 US 20060171152A1 US 33474506 A US33474506 A US 33474506A US 2006171152 A1 US2006171152 A1 US 2006171152A1
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Prior art keywords
light emitting
substrate
emitting element
phosphor
emitting device
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Abandoned
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US11/334,745
Inventor
Yoshinobu Suehiro
Seiji Yamaguchi
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Toyoda Gosei Co Ltd
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Toyoda Gosei Co Ltd
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Publication date
Priority claimed from JP2005012810A external-priority patent/JP5109226B2/en
Priority claimed from JP2005027484A external-priority patent/JP4492378B2/en
Application filed by Toyoda Gosei Co Ltd filed Critical Toyoda Gosei Co Ltd
Assigned to TOYODA GOSEI CO., LTD. reassignment TOYODA GOSEI CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SUEHIRO, YOSHINOBU, YAMAGUCHI, SEIJI
Publication of US20060171152A1 publication Critical patent/US20060171152A1/en
Priority to US12/929,331 priority Critical patent/US8294160B2/en
Abandoned legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/52—Encapsulations
    • H01L33/56—Materials, e.g. epoxy or silicone resin
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93—Batch processes
    • H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
    • F21K9/00—Light sources using semiconductor devices as light-generating elements, e.g. using light-emitting diodes [LED] or lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10—Bump connectors; Manufacturing methods related thereto
    • H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161—Disposition
    • H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805—Shape
    • H01L2224/4809—Loop shape
    • H01L2224/48091—Arched
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481—Disposition
    • H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484—Connecting portions
    • H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/00011—Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/12—Passive devices, e.g. 2 terminal devices
    • H01L2924/1204—Optical Diode
    • H01L2924/12041—LED
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181—Encapsulation
    • H01L2924/1815—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/483—Containers
    • H01L33/486—Containers adapted for surface mounting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50—Wavelength conversion elements
    • H01L33/507—Wavelength conversion elements the elements being in intimate contact with parts other than the semiconductor body or integrated with parts other than the semiconductor body

Definitions

  • This invention relates to a wavelength-conversion type light emitting device to wavelength-convert a light emitted from a light emitting element and, in particular, to a wavelength-conversion type light emitting device that is excellent in reliability, stable in brightness over a long term, and excellent in unevenness of emission color.
  • this invention relates to a light emitting device that the light emitting element is sealed with a glass sealing material and, in particular, to a light emitting device that is excellent in mass productivity, in sealing property and deterioration resistance under a high-temperature and high-humidity environment, and in evenness of emission color.
  • this invention relates to a method of making the above light emitting device.
  • a light emitting device is conventionally known that uses an LED (light emitting diode) element as a light source.
  • LED light emitting diode
  • a light emitting device is in wide use for an automobile lighting apparatus, a backlight light source in LCD devices, a lamp in small electronic device etc., and the other uses are also promising.
  • a semiconductor light emitting device is proposed that white light is radiated by wavelength-converting a light emitted from the LED element by a phosphor (e.g., JP-A-2004-221619, [0009], [0014] and FIG. 1 thereof)
  • a phosphor e.g., JP-A-2004-221619, [0009], [0014] and FIG. 1 thereof
  • the semiconductor light emitting device in JP-A-2004-221619 comprises an LED with a lens-shaped resin sealing portion, and a transparent phosphor cover which is disposed around the resin sealing portion.
  • the LED is a GaN-based semiconductor light emitting element which has an emission peak in 430 to 480 nm.
  • the phosphor cover comprises a thin-film resin which has an elasticity to be in close contact with the resin sealing portion, and a phosphor which radiates a fluorescent light by being excited by light emitted from the semiconductor light emitting element.
  • the semiconductor light emitting device in JP-A-2004-221619 is advantageous in that a desired emission color with high brightness can be obtained by mixing a light emitted from the semiconductor light emitting element with a light wavelength-converted by the phosphor since the phosphor cover is disposed around the resin sealing portion.
  • the semiconductor light emitting device in JP-A-2004-221619 has the following problems.
  • a resin-sealed type LED is conventionally known that an LED element is sealed with a transparent resin material such as an epoxy resin.
  • the resin-sealed type LED is subjected to a deterioration such as yellowing when the transparent resin material is reacted with intense light while it is excellent in sealing workability due to using the transparent resin material.
  • a group III nitride-based compound semiconductor light emitting element to emit short-wavelength light
  • the transparent resin material near the element can be yellowed due to high-energy light emitted from the element and heat generated from the element. Therefore, the light extraction efficiency may lower significantly.
  • a light emitting device that uses a low-melting glass as the sealing material (e.g., JP-A-11-177129, [0007] and FIG. 1 thereof).
  • FIG. 15 is a cross sectional view showing the light emitting device disclosed in JP-A-11-177129.
  • the light emitting device 50 comprises an LED element 51 , a printed-circuit board 52 , a wiring pattern 53 formed on the surface of the printed-circuit board 52 , a wire 54 which electrically connects between the LED element 51 and the wiring pattern 53 , and the low-melting glass 55 which seals the LED element 51 and the wire 54 , and has a refractive index of about 2 which is near 2.3 or so, the refractive index of a GaN-based LED element.
  • the light emitting device in JP-A-11-177129 is advantageous in that a light returned to the inside of the LED element 51 due to total reflection on the surface thereof can be reduced by sealing the LED element 51 with the low-melting glass 55 which has a refractive index close to that of the GaN-based LED element.
  • the amount of light entering into the low-melting glass 55 after being emitted from the LED element 51 can be increased.
  • the light extraction efficiency can be enhanced as compared to the conventional device with the LED element sealed with the epoxy resin.
  • the light emitting device in JP-A-11-177129 has problems in practical manufacturing and mass productivity since the low-melting glass cannot be easy processed like the epoxy resin.
  • the wire when the LED element is sealed with the glass in high-viscosity state so as to prevent the heat damage of the LED element, the wire may be deformed by the high-viscosity glass so that the electrical short-circuiting or the disconnection of wire may occur. Even when using the glass in low-viscosity state, the molding as shown in FIG. 15 is difficult to conduct. On the other hand, a resin printed-circuit board cannot endure the processing temperature, and an inorganic printed-circuit board may be broken when being pressed by a mold. Further, since the glass-sealed LED element requires an individual processing, not a batch processing due to the high-temperature processing, it cannot be applied to the mass production.
  • a light emitting device comprises:
  • the substrate comprising an inorganic material
  • sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material
  • optical-shaped portion formed nearly semispherical, the optical-shaped portion comprising the inorganic sealing material
  • a phosphor portion formed covering the optical-shaped portion.
  • a light emitting device comprises:
  • the substrate comprising an inorganic material
  • sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material
  • optical-shaped portion formed nearly semispherical, the optical-shaped portion comprising the inorganic sealing material
  • the inorganic material comprises a thermal expansion coefficient equivalent to that of the light emitting element
  • the inorganic sealing material comprises a thermal expansion coefficient equivalent to that of the substrate and the light emitting element.
  • the inorganic sealing material comprises a glass material.
  • the phosphor portion comprises an inorganic material and a phosphor.
  • the phosphor portion comprises a thermal expansion coefficient greater than the sealing portion.
  • the phosphor portion comprises a dichroic mirror that a plurality of materials with different refractive indexes are alternately laminated, and a phosphor layer formed on the dichroic mirror.
  • the the phosphor portion comprises a low-melting fluoride glass.
  • the optical-shaped portion comprises a dimension to define a ratio to a width of the light emitting element of 2 1/2 or more and 10 or less.
  • a light emitting device comprises:
  • the substrate comprising an inorganic material
  • sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material
  • sealing portion comprises a cutting face at which an interface of the inorganic sealing material and the substrate is exposed and by which the light emitting element is surrounded,
  • the sealing portion is covered with the coating portion on an entire surface thereof.
  • a light emitting device comprises:
  • the substrate comprising an inorganic material
  • sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material
  • sealing portion comprises a cutting face by which the light emitting element is surrounded
  • the sealing portion is covered with the coating portion on an entire surface thereof that light emitted from the light emitting element reaches directly.
  • the light emitting element comprises a flip-mounting type light emitting element
  • the substrate comprises the inorganic material that comprises a thermal expansion coefficient equivalent to that of the sealing portion.
  • the coating portion comprises a light-transmitting inorganic material.
  • the coating portion comprises a phosphor-containing material.
  • the coating portion comprises a dichroic mirror.
  • a method of making a light emitting device comprises:
  • the coating in the fifth step is formed by sputtering.
  • the coating in the fifth step is formed by electrostatic coating.
  • the sealing property and reliability can be enhanced. Further, deterioration caused by light emitted from the light emitting element can be suppressed, and a stable brightness can be kept without unevenness in emission color over a long term.
  • the sealing portion and the substrate are covered with the light-transmitting inorganic coating portion, the water resistance of the sealing portion can be enhanced and a good adhesion between the substrate and the sealing portion can be secured. Further, even in high humidity environment, it can have a good sealing property and deterioration resistance.
  • FIG. 1A is a cross sectional view showing a light emitting device (herein also called LED) in a first preferred embodiment according to the invention
  • FIG. 1B is a schematic diagram illustrating light radiation on the surface of a glass sealing portion
  • FIGS. 2A to 2 E are cross sectional views showing a method of making the LED in the first embodiment
  • FIG. 3 is a cross sectional view showing a light emitting device in a second preferred embodiment according to the invention.
  • FIG. 4 is a cross sectional view showing a light emitting device in a third preferred embodiment according to the invention.
  • FIG. 5A is a plain view showing an LED in a fifth preferred embodiment according to the invention.
  • FIG. 5B is a cross sectional view cut along a line B-B in FIG. 5A ;
  • FIG. 6A is a cross sectional view showing an LED lamp in a sixth preferred embodiment according to the invention.
  • FIG. 6B is a cross sectional view showing: a light-emitting portion mounted on the LED lamp in FIG. 6A ;
  • FIG. 7 is a cross sectional view showing a light emitting device in a seventh preferred embodiment according to the invention.
  • FIG. 8A to 8 C are cross sectional views showing a wiring formation step to a glass preparation step in a method of making the LED in FIG. 7 ;
  • FIG. 9A to 9 D are cross sectional views showing a glass sealing step to an LED separation step in the method of making the LED in FIG. 7 ;
  • FIG. 10 is a cross sectional view showing a light emitting device in an eighth preferred embodiment according to the invention.
  • FIG. 11 is a cross sectional view showing a light emitting device (LED) in a ninth preferred embodiment according to the invention.
  • FIG. 12A to 12 C are cross sectional views showing a wiring formation step to a glass preparation step in a method of making the LED in FIG. 11 ;
  • FIG. 13A to 13 C are cross sectional views showing a glass sealing step to an LED separation step in the method of making the LED in FIG. 11 ;
  • FIG. 14A to 14 D are cross sectional views showing a glass sealing step to an LED separation step in a method of making a concave groove in an LED in a tenth preferred embodiment according to the invention.
  • FIG. 15 is a cross sectional view showing the conventional light emitting device in JP-A-11-177129.
  • FIG. 1A is a cross sectional view showing a light emitting device in the first preferred embodiment according to the invention.
  • FIG. 1B is a schematic diagram illustrating light radiation on the surface of a glass sealing portion.
  • the LED 1 comprises: a flip-chip type LED element 2 ; an Al 2 O 3 substrate 3 , as an inorganic material substrate, provided with circuit patterns 4 A, 4 B, and via holes 3 A; an Au bump 5 to electrically connect between the circuit pattern 4 B and an electrode of the LED element 2 ; and a glass sealing portion 6 that is made of an inorganic sealing material to seal the Al 2 O 3 substrate 3 and the LED element 2 and is provided with an optical-shaped portion 6 A formed semispherical.
  • the LED element 2 comprises, sequentially grown on an underlying sapphire substrate, an AlN buffer layer and a GaN-based semiconductor layer including an n-GaN layer, a light-emitting layer, and a p-GaN layer. It has a horizontal type electrode structure that a part of the n-GaN layer is exposed as an n-electrode formation region by etching the p-GaN layer through the n-GaN layer. It is flip-chip mounted on the circuit pattern 4 B through the Au bump 5 .
  • the LED element 2 has a central emission wavelength of about 470 nm and a thermal expansion coefficient of 7 ⁇ 10 ⁇ 6 /° C.
  • the ratio of the width of the optical-shaped portion 6 A of the LED 1 and the width (i.e., the maximum width, the length of a diagonal line in case of a square) of the LED element 2 is determined to be 2 1/2 or more and 10 or less.
  • the Al 2 O 3 substrate 3 has a thermal expansion coefficient of 7 ⁇ 10 ⁇ 6 /° C., which is nearly equivalent to that of the LED element 2 . It is provided with the circuit patterns 4 A, 4 B and the via pattern 4 C which are made of tungsten (W)—nickel (Ni)—gold (Au).
  • the glass sealing portion 6 is made of low-melting glass which can be processed by hot pressing at a low melting point of 600° C. or less, and it has a thermal expansion coefficient (7 ⁇ 10 ⁇ 6 /° C.) nearly equivalent to that of the LED element 2 and the Al 2 O 3 substrate 3 . It is, on its surface, provided with the optical-shaped portion 6 A which is formed semispherical, and a phosphor film 6 B which is formed, as a phosphor portion, on the surface of the optical-shaped portion 6 A.
  • the phosphor film 6 B is formed by coating an acrylic coating material containing Ce:YAG (yttrium aluminum garnet) phosphor on the surface of the optical-shaped portion 6 A and then drying it. As shown in FIG. 1B , light Lb reaching the phosphor film 6 B while transmitting the glass sealing portion 6 is irradiated to the phosphor and, thereby, yellow lights Lb 1 to Lb 3 are radiated from the phosphor.
  • Ce:YAG yttrium aluminum garnet
  • FIGS. 2A to 2 E are cross sectional views showing the method of making the LED 1 in the first embodiment.
  • the Al 2 O 3 substrate 3 is used which is previously provided with a V groove 3 G for separation and a via hole.
  • a W paste is screen-printed on the Al 2 O 3 substrate 3 according to the circuit pattern. Then, the Al 2 O 3 substrate 3 with the W paste printed thereon is heated at 1500° C. to burn the W onto the Al 2 O 3 substrate 3 . Then, Ni plating and Au plating are provided on the W to form the circuit patterns 4 A, 4 B and the via pattern 4 C.
  • the LED element 2 is flip-mounted through the Au bump 5 on the circuit pattern 4 B of the Al 2 O 3 substrate 3 .
  • a plate-like P 2 O 5 —ZnO—Li 2 O-based low-melting glass 60 is parallel placed over the Al 2 O 3 substrate 3 .
  • the low-melting glass 60 is hot-pressed at 550 to 500° C. in a nitrogen atmosphere.
  • the low-melting glass 60 is bonded to the surface of the substrate through oxides contained in the Al 2 O 3 substrate 3 and the glass, and the glass sealing portion 6 is molded to have the semispherical optical-shaped portion 6 A according to the form of a pressing mold.
  • the phosphor-containing acrylic coating material is coated on the surface of the glass sealing portion 6 and then dried to form the phosphor film 6 B on the surface of the glass sealing portion 6 .
  • the LED 1 is separated by cutting the Al 2 O 3 substrate 3 along the V groove 3 G.
  • the light-emitting layer When current is fed through the circuit pattern 4 A from a power supply (not shown), the light-emitting layer is current-fed through the electrode of the LED element 2 . Thereupon, the light-emitting layer emits blue light.
  • the blue light is inputted from the GaN-based semiconductor layer through the sapphire substrate to the glass sealing portion 6 , reaching the optical-shaped portion 6 A.
  • the blue light reaching the optical-shaped portion 6 A is then inputted to the phosphor film 6 B.
  • the phosphor contained in the phosphor film 6 B radiates yellow light while being excited by the inputted blue light.
  • white light is generated by mixing the yellow light with the blue light, and externally radiated from the phosphor film 6 B.
  • the LED element 2 Since the LED element 2 is sealed with the glass sealing portion 6 with the semispherical optical-shaped portion 6 A, deterioration in the sealing material due to the self-heating or self-irradiating of the LED element 2 does not occur so that the LED 1 can have an excellent sealing property of the LED element 2 and a stable brightness over a long term. Further, the bonding strength between the glass sealing portion 6 and the Al 2 O 3 substrate 3 can be enhanced since they have an equivalent thermal expansion coefficient each other, different from the case of using the resin sealing material. Thus, the small LED 1 can be obtained with a high reliability.
  • the phosphor film 6 B is disposed at a suitable distance from the light extracting surface (i.e., bottom of the sapphire substrate) of the LED element 2 , and the phosphor film 6 B is provided with a uniform thickness.
  • the difference in optical path length can be substantially removed by forming the uniform thin-film phosphor layer on the surface of the optical-shaped portion 6 A.
  • the optical-shaped portion 6 A is formed nearly semispherical so as to allow the suitable distance from the LED element 2 to the phosphor film 6 B so that lights emitted from the LED element 2 in any directions have a substantially even incident angle, around the perpendicular incident angle, to the optical-shaped portion 6 A.
  • interface reflection loss at the optical-shaped portion 6 A can be minimized such that light reflected on the surface of the optical-shaped portion 6 A or on the phosphor film 6 B is absorbed again by the LED element 2 .
  • the incident angle to the phosphor film 6 B can be substantially uniformed, unevenness in emission color can be prevented.
  • unevenness in emission color or reduction in light extraction efficiency can be prevented even in case of the downsized LED 1 , the amount of phosphor used can be reduced and, thereby, the manufacturing cost can be reduced.
  • the phosphor film 6 B can be formed by coating the phosphor-containing acrylic coating material on the plural LED's 1 disposed on the substrate.
  • the good phosphor film 6 B can be formed together on the plural LED's 1 to enhance the productivity.
  • the acrylic resin is excellent in light resistance, deterioration in the phosphor film 6 B can be prevented.
  • the LED 1 is separated through the V groove 3 G formed on the Al 2 O 3 substrate 3 , the LED LED 1 may be diced by using a dicer.
  • the LED element 2 mounted on the Al 2 O 3 substrate 3 may be a GaP-based or GaAs-based LED element other than the GaN-based LED element.
  • the phosphor can be chosen from phosphors to be excited by the emission wavelength of an LED element used.
  • the optical-shaped portion 6 A is intended not to focusing of light but to external light radiation with high efficiency and good evenness in emission color. If the focusing characteristic is required, a focusing optical system can be provided such that the LED 1 is further resin-molded.
  • the ratio of the width of the optical-shaped portion 6 A and the width of the LED element 2 is preferably 5 or less although it depends on the sealing material, the bonding strength to the substrate and the damage under processing conditions etc.
  • FIG. 3 is a cross sectional view showing a light emitting device in the second preferred embodiment according to the invention.
  • like components are indicated by the same numerals used in the first embodiment.
  • the LED 1 of the second embodiment is different from that of the first embodiment in that a phosphor-containing glass layer 6 C is used in place of the phosphor film 6 B of the first embodiment.
  • the phosphor-containing glass layer 6 C is made of a mixture material (with a melting point of about 300° C.) that a phosphor particle with an average outside diameter of 10 ⁇ m is mixed with a fluoride low-melting glass particle with an average outside diameter of 10 ⁇ m.
  • the phosphor-containing glass layer 6 C is formed integrally on the surface of the glass sealing portion 6 with the optical-shaped portion 6 A by conducting the electrostatic coating of the mixture material while heating the glass sealing portion 6 at 300° C. and applying a voltage thereto and then heating it at 350° C.
  • the electrostatic coating can be conducted by applying the voltage thereto while heating it. Further, since the mixture material of the phosphor particle and the fluoride low-melting glass particle is electrostatically adhered to the surface of the glass sealing portion 6 , an effect other than the effects of the first embodiment can be obtained that the mixture material can be, with a uniform film thickness, adhered to the uneven surface of the glass sealing portion 6 and the phosphor-containing glass layer 6 C with a uniform thickness can be easy formed by fusion bonding. Further, since the fluoride coating of fluoride low-melting glass is formed on the surface of the glass sealing portion 6 , the humidity resistance of the LED 1 can be further enhanced.
  • the fluorine low-melting glass with a thermal expansion coefficient greater than the glass sealing portion 6 is adhered onto the semispherical glass sealing portion 6 , stress in a direction likely to cause the cracking can be suppressed when it is cooled to room temperature from the melted state free of stress. Namely, it is composed such that only compressive stress is generated except tensile stress and shear stress.
  • the fluorine low-melting glass with the phosphor particle contained therein needs to have a thermal expansion coefficient greater than the glass sealing portion 6 .
  • FIG. 4 is a cross sectional view showing a light emitting device in the third preferred embodiment according to the invention.
  • the LED 1 of the third embodiment is different from that of the first embodiment in that a dichroic mirror 6 D is formed between the glass sealing portion 6 and the phosphor film 6 B such that it prevents the re-entering of light radiated from the phosphor to the glass sealing portion 6 .
  • the dichroic mirror 6 D is formed by laminating alternately TiO 2 film and SiO 2 film and severs to transmit light of less than 500 nm and to reflect light of more than 500 nm.
  • the dichroic mirror 6 D can transmit blue light of 470 nm emitted from the LED element 2 and reflect yellow light radiated from the phosphor of the phosphor film 6 B to prevent the re-entering thereof to the glass sealing portion 6 .
  • the brightness can be enhanced in addition to the effects of the first embodiment since the dichroic mirror 6 D is provided between the glass sealing portion 6 and the phosphor film 6 B. Namely, it can be prevented that the yellow light radiated from the phosphor film 6 B is re-entered to the glass sealing portion 6 and absorbed in the LED element 2 to reduce the light extraction efficiency of the LED 1 .
  • the TiO 2 film and SiO 2 film also are a humidity-resistant coating material, the humidity resistance of the device can be further enhanced.
  • the fourth embodiment is constructed such that the phosphor film 6 B is formed by sputtering on the optical-shaped portion 6 A of the LED 1 as described in the third embodiment.
  • the phosphor film 6 B by forming the phosphor film 6 B by sputtering, the phosphor film 6 B can have a high phosphor concentration with high accuracy and, therefore, can have the same effects as the third embodiment.
  • yellow light generated from the phosphor film 6 B is more likely to be radiated to the direction of the glass sealing portion 6 due to the high phosphor concentration.
  • the dichroic mirror 6 D can reflect the yellow light being radiated to the direction of the glass sealing portion 6 , the mixing of the yellow light and blue light can be promoted to obtain white light without unevenness in emission color.
  • FIG. 5A is a plain view showing an LED in the fifth preferred embodiment according to the invention.
  • FIG. 5B is a cross sectional view cut along a line B-B in FIG. 5A .
  • the Al 2 O 3 substrate 3 is provided with a heat-radiating pattern 4 D that is made of copper foil and allows heat generated from the plural LED elements 2 to be radiated outside of the substrate.
  • the phosphor film 6 B contains R, G and B phosphors at a predetermined ratio to be excited by ultraviolet light emitted from the LED element 2 , and it radiates white light based on the mixing of R, G and B visible lights generated by being excited.
  • the dichroic mirror 6 D is formed by laminating alternately Ta 2 O 5 film and SiO 2 film and severs to transmit ultraviolet light emitted from the LED element 2 and to reflect the R, G and B visible lights radiated from the phosphor film 6 B to prevent the re-entering thereof to the glass sealing portion 6 .
  • the plural light-emitting portions 10 are formed on the Al 2 O 3 substrate 3 with the ultraviolet LED element 2 having high emission efficiency and the phosphor film 6 B containing the R, G and B phosphors. Therefore, the LED 1 can radiate white light with a color rendering property at high brightness, in addition to the effects of the third embodiment.
  • the sealing material does not deteriorate since the LED 1 is sealed with the glass sealing portion 6 .
  • the LED 1 can have a high reliability over a long term while using the ultraviolet LED element 2 with the high emission efficiency as a light source.
  • the LED 1 of the fifth embodiment has the nine light-emitting portions 10 formed on the Al 2 O 3 substrate 3 , the number of the light-emitting portions 10 may be changed.
  • FIG. 6A is a cross sectional view showing an LED lamp in the sixth preferred embodiment according to the invention.
  • FIG. 6B is a cross sectional view showing a light-emitting portion mounted on the LED lamp in FIG. 6A .
  • the LED lamp 100 comprises a case 20 made of nylon resin, a light-emitting portion 10 mounted on an element mounting surface 21 formed at the bottom of a concave portion of the case 20 , a phosphor film 22 A which covers an opening of the case 20 and contains R, G and B phosphors, and a dichroic mirror 23 which is laminated on the phosphor film 22 A.
  • the dichroic mirror 23 serves to transmit visible light and to reflect ultraviolet light.
  • the light-emitting portion 10 comprises the ultraviolet LED element 2 as a light source, and the dichroic mirror 6 D formed on the optical-shaped portion 6 A to transmit visible light and to reflect ultraviolet light.
  • the case 20 comprises a reflection surface 22 formed curved from the element mounting surface 21 to the opening of the case 20 , a circuit pattern 24 A formed on the bottom of the case 20 for external circuit connection, a circuit pattern 24 B formed on the element mounting surface 21 for the mounting of the light-emitting portion 10 , and an internal wiring pattern 24 C to connect between the circuit pattern 24 A and the circuit pattern 24 B.
  • the light-emitting layer When current is fed through the circuit pattern 24 A from a power supply (not shown), the light-emitting layer is current-fed through the electrode of the LED element 2 . Thereupon, the light-emitting layer emits blue light. The blue light is inputted from the GaN-based semiconductor layer through the sapphire substrate to the glass sealing portion 6 , reaching the optical-shaped portion 6 A. The blue light reaching the optical-shaped portion 6 A is then transmitted through the dichroic mirror 6 D, radiated outside of the light-emitting portion 10 .
  • Light radiated laterally from the light-emitting portion 10 is inputted to the phosphor film 22 A formed on the reflection surface 22 , exciting the R, G and B phosphors therein and then reflected in directions according to the curved face of the reflection surface 22 .
  • the reflected light is mixed with ultraviolet light transmitted through the dichroic mirror 6 D of the light-emitting portion 10 to generate visible light.
  • the visible light is transmitted through the dichroic mirror 23 and radiated outside of the case 20 .
  • the LED lamp 100 can have high brightness and reliability without unevenness in emission color.
  • the ultraviolet LED element 2 may be replaced by the blue LED element 2 and the R, G and B phosphors contained in the phosphor film 22 A may be replaced by a yellow phosphor such as YAG. Thereby, white light can be radiated outside of the LED lamp 100 .
  • FIG. 7 is a cross sectional view showing a light emitting device in the seventh preferred embodiment according to the invention.
  • the LED 1 comprises: a flip-chip type LED element 2 ; an Al 2 O 3 substrate 3 , as an inorganic material substrate, provided with circuit patterns 4 A, 4 B, and via holes 3 A; an Au bump 5 to electrically connect between the circuit pattern 4 B and an electrode of the LED element 2 ; and a glass sealing portion 6 that is made of an inorganic sealing material to seal the Al 2 O 3 substrate 3 and the LED element 2 .
  • the LED element 2 comprises, sequentially grown on an underlying sapphire substrate, an AlN buffer layer and a GaN-based semiconductor layer including an n-GaN layer, a light-emitting layer, and a p-GaN layer. It has a horizontal type electrode structure that a part of the n-GaN layer is exposed as an n-electrode formation region by etching the p-GaN layer through the n-GaN layer. It is flip-chip mounted on the circuit pattern 4 B through the Au bump 5 .
  • the LED element 2 has a central emission wavelength of about 470 nm and a thermal expansion coefficient of 7 ⁇ 10 ⁇ 6 /° C. The ratio of the width of the LED 1 and the width of the LED element 2 is determined to be 1 or more and 5 or less.
  • the Al 2 O 3 substrate 3 has a thermal expansion coefficient of 7 ⁇ 10 ⁇ 6 /° C., which is nearly equivalent to that of the LED element 2 . It is provided with the circuit patterns 4 A, 4 B and the via pattern 4 C which are made of tungsten (W)—nickel (Ni)—gold (Au) on its element mounting surface, via hole 3 A and bottom surface. Further, it is provided with a step portion 3 B at a portion corresponding to an outer edge of the LED 1 .
  • the glass sealing portion 6 is made of low-melting glass which can be processed by hot pressing at a low melting point of 600° C. or less, and it has a thermal expansion coefficient (7 ⁇ 10 ⁇ 6 /° C.) nearly equivalent to that of the LED element 2 and the Al 2 O 3 substrate 3 . It is, on its surface, provided with the optical-shaped portion 6 A which is formed semispherical, and an Al 2 O 3 coating film 6 F which is formed on the surface of the optical-shaped portion 6 A.
  • the Al 2 O 3 coating film 6 F is formed by sputtering Al 2 O 3 on the surface of the optical-shaped portion 6 A and then drying it.
  • the Al 2 O 3 coating film 6 F is provided with an end-face protecting portion 6 E which covers the end face of the glass sealing portion 6 and the step portion 3 B.
  • FIG. 8A to 8 C are cross sectional views showing a wiring formation step to a glass preparation step in the method of making the LED in FIG. 7 .
  • FIG. 9A to 9 D are cross sectional views showing a glass sealing step to an LED separation step in the method of making the LED in FIG. 7 .
  • a W paste is screen-printed on the Al 2 O 3 substrate 3 according to the circuit pattern. Then, the Al 2 O 3 substrate 3 with the W paste printed thereon is heated at 1500° C. to burn the W-onto the Al 2 O 3 substrate 3 . Then, Ni plating and Au plating are provided on the W to form the circuit patterns 4 A, 4 B and the via pattern 4 C.
  • the LED element 2 is flip-mounted through the Au bump 5 on the circuit pattern 4 B of the Al 2 O 3 substrate 3 .
  • a plate-like P 2 O 5 —ZnO—Li 2 O-based low-melting glass 60 is parallel placed over the Al 2 O 3 substrate 3 .
  • the low-melting glass 60 is hot-pressed at 550 to 500° C. in a nitrogen atmosphere.
  • the low-melting glass 60 is bonded to the surface of the substrate through oxides contained in the Al 2 O 3 substrate 3 and the glass, and the glass sealing portion 6 is molded to have the semispherical optical-shaped portion 6 A according to the form of a pressing mold.
  • a groove 30 is formed by half-cutting a thin portion of the glass sealing portion 6 by using a dicing saw.
  • the groove 30 has such a depth that can prevent the separation of the Al 2 O 3 substrate 3 .
  • the interface of the glass sealing portion 6 and the Al 2 O 3 substrate 3 is exposed, and a part corresponding to the LED 1 is, in plain view thereof, surrounded by the groove 30 as a cutting face.
  • the Al 2 O 3 coating film 6 F is formed by sputtering to cover the surface of the glass sealing portion 6 .
  • the entire surface of the part corresponding to the LED 1 surrounded by the groove 30 is covered with the Al 2 O 3 coating film 6 F.
  • the LED 1 is separated by cutting the Al 2 O 3 substrate 3 along the groove 30 .
  • the LED 1 separated has the end face of the glass sealing portion 6 covered with the Al 2 O 3 coating film.
  • the light-emitting layer When current is fed through the circuit pattern 4 A from a power supply (not shown), the light-emitting layer is current-fed through the electrode of the LED element 2 . Thereupon, the light-emitting layer emits blue light.
  • the blue light is inputted from the GaN-based semiconductor layer through the sapphire substrate to the glass sealing portion 6 , reaching the optical-shaped portion 6 A.
  • the blue light reaching the optical-shaped portion 6 A is externally radiated through the Al 2 O 3 coating film 6 F.
  • the grove 30 is formed penetrating through the glass sealing portion 6 into the Al 2 O 3 substrate 3 , and the Al 2 O 3 coating film 6 F is formed on the surface of the glass as well as the groove 30 to protect the surface of the glass. Therefore, even when the LED 1 is separated, the end face of the glass sealing portion 6 can be thereby protected without being exposed. Thus, even when the glass sealing portion 6 has a relatively low humidity resistance due to its restrictions such as reduction in glass melting point, adjustment in thermal expansion coefficient or refractive index etc., the glass sealing portion 6 can be stably used over a long term without deteriorating under high temperature and humidity environment.
  • the Al 2 O 3 coating film 6 F is formed by sputtering, it can be easy formed in the groove 30 .
  • the LED 1 can be easy separated after the formation of the Al 2 O 3 coating film 6 F. Thus, the productivity can be enhanced.
  • the coating film 6 F may be made of SiO 2 , SiN, MgF 2 etc. other than Al 2 O 3 .
  • the groove 30 is formed by using the dicing saw
  • the groove 30 may be formed by laser light.
  • the laser processing allows reduction in process time and enhancement in productivity.
  • Especially short-time pulse irradiation such as femtosecond laser pulse allows the formation of a smooth-faced groove.
  • FIG. 10 is a cross sectional view showing a light emitting device in the eighth preferred embodiment according to the invention. Like components are indicated by the same numerals used in the seventh embodiment.
  • the LED 1 of the eighth embodiment is different from that of the seventh embodiment in that a dichroic mirror 6 D and a phosphor-containing glass layer 6 C are used place of the Al 2 O 3 coating film 6 F.
  • the dichroic mirror 6 D is formed by laminating alternately TiO 2 film and SiO 2 film and severs to transmit light of less than 500 nm and to reflect light of more than 500 nm.
  • the dichroic mirror 6 D can transmit blue light of 470 nm emitted from the LED element 2 and reflect yellow light radiated-from the phosphor of the phosphor-containing glass layer 6 C to prevent the re-entering thereof to the glass sealing portion 6 .
  • the phosphor-containing glass layer 6 C is made of a mixture material (with a melting point of about 300° C.) that a phosphor particle with an average outside diameter of 10 ⁇ m is mixed with a fluoride low-melting glass particle with an average outside diameter of 10 ⁇ m.
  • the phosphor-containing glass layer 6 C is formed integrally on the surface of the glass sealing portion 6 C is formed integrally on the surface of the glass sealing electrostatic coating of the mixture material while heating glass sealing portion 6 at 300° C. and applying a voltage thereto and then heating it at 350° C.
  • the phosphor used is to be excited by blue light emitted from the LED element 2 .
  • the phosphor can be Ce:YAG (yttrium aluminum garnet) phosphor.
  • the dichroic mirror 6 D and the phosphor-containing glass layer 6 C are formed on the entire surface of the glass sealing portion 6 , unevenness in emission color can be suppressed.
  • the electrostatic coating can be conducted by applying the voltage thereto while heating it. Further, since the mixture material of the phosphor particle and the fluoride low-melting glass particle is electrostatically adhered to the surface of the glass sealing portion 6 , an effect other than the effects of the seventh embodiment can be obtained that the mixture material can be, with a uniform film thickness, adhered to the uneven surface of the glass sealing portion 6 and the phosphor-containing glass layer 6 C with a uniform thickness can be easy formed by fusion bonding.
  • the fluoride coating of fluoride low-melting glass is formed on the surface of the glass sealing portion 6 , the humidity resistance of the LED 1 can be further enhanced.
  • FIG. 11 is a cross sectional view showing a light emitting device (LED) in the ninth preferred embodiment according to the invention.
  • the LED 1 of the ninth embodiment is different from that of the seventh or eighth embodiment in that it is provided with the Al 2 O 3 substrate 3 having a concave portion 3 C with a height different from the element mounting surface, the glass sealing portion 6 is formed covering the concave portion 3 C as well as the Al 2 O 3 substrate 3 and the LED element 2 , and that it is provided with only the phosphor-containing glass layer 6 C instead of the Al 2 O 3 coating film 6 F and the dichroic mirror 6 D.
  • the glass sealing portion 6 is formed by hot pressing to cover the concave portion 3 C as well as having the optical-shaped portion 6 A.
  • the phosphor-containing glass layer 6 C as described in the eighth embodiment is formed on the surface of the glass sealing portion 6 .
  • FIG. 12A to 12 C are cross sectional views showing a wiring formation step to a glass preparation step in the method of making the LED in FIG. 11 .
  • FIG. 13A to 13 C are cross sectional views showing a glass sealing step to an LED separation step in the method of making the LED in FIG. 11 .
  • a W paste is, according to the circuit pattern, screen-printed on the Al 2 O 3 substrate 3 .
  • the Al 2 O 3 substrate 3 with the W paste printed thereon is heated at 1500° C. to burn the W onto the Al 2 O 3 substrate 3 .
  • Ni plating and Au plating are provided on the W to form the circuit patterns 4 A, 4 B and the via pattern 4 C.
  • the concave portion 3 C is formed by cutting or sand-blasting after the formation of the circuit patterns 4 A, 4 B and the via pattern 4 C. Alternatively, it may be formed before the formation.
  • the LED element 2 is flip-mounted through the Au bump 5 on the circuit pattern 4 B of the Al 2 O 3 substrate 3 .
  • the low-melting glass 60 is hot-pressed at 550 to 500° C. in a nitrogen atmosphere.
  • the low-melting glass 60 is bonded to the surface of the substrate through oxides contained in the Al 2 O 3 substrate 3 and the glass, and the glass sealing portion 6 is molded to have the semispherical optical-shaped portion 6 A according to the form of a pressing mold.
  • the glass sealing portion 6 is provided with a concave groove 6 G which is a thin portion corresponding to the concave portion 3 C.
  • the phosphor-containing glass layer 6 C is formed.
  • the LED 1 is separated by cutting the substrate along the concave groove 6 G by using a dicer.
  • the Al 2 O 3 substrate 3 with the concave portion 3 C formed thereon is sealed with the low-melting glass 60 , the low-melting glass 60 is concave-convex sealed in close contact with the side face of the concave portion 3 C based on internal stress to be generated by heat contraction of the low-melting glass 60 .
  • the glass sealing portion 6 is in close contact with the glass sealing portion 6 at the edge of the LED 1 , the separation of glass or the penetration of moisture can be very effectively prevented.
  • the glass sealing portion 6 is slightly exposed at the end-face protecting portion 6 E, the optical influence thereof is negligible such that unevenness in emission color does not occur since light emitted from the LED element 2 does not reach directly this portion. Meanwhile, in this case, the glass sealing portion 6 is desirably of a material with high humidity resistance.
  • the Al 2 O 3 coating film may be formed in addition to the phosphor-containing glass layer 6 C. Glass may be clouded at its surface in a high temperature and humidity environment. However, when the Al 2 O 3 coating film is formed on the glass surface that light emitted from the LED element 2 reaches directly, the optical characteristics do not change.
  • FIG. 14A to 14 D are cross sectional views showing a glass sealing step to an LED separation step in a method of making a concave groove in an LED in the tenth preferred embodiment according to the invention.
  • the tenth embodiment is constructed such the glass sealing portion 6 is prevented from being exposed at the concave portion 3 C as described in the ninth embodiment.
  • the glass sealing step is conducted such that the concave groove 6 G corresponding to the concave portion 3 C has a groove width not to disturb the groove shaping process as described later.
  • the other process is the same as described in the glass sealing step in FIG. 13A .
  • the groove formation step is conducted such that the groove 30 is formed by irradiating laser light to the concave groove 6 G of the glass sealing portion 6 to allow the Al 2 O 3 substrate 3 to be exposed.
  • the dicing with a dicer may be conducted to form the groove 30 with a depth reaching the Al 2 O 3 substrate 3 .
  • the coating film formation step is conducted such that the Al 2 O 3 coating film 6 F is formed covering the Al 2 O 3 substrate 3 exposed in the groove formation step so as to coat the concave groove 6 G exposed by the irradiation of the laser light.
  • the LED separation step is conducted such that LED 1 is individually separated by cutting the substrate at the groove 30 by a dicer after the coating film formation step.
  • the end-face of the separated LED 1 is concave-convex sealed with the glass sealing portion 6 at the concave portion 3 C of the Al 2 O 3 substrate 3 , and the interface of the glass sealing portion 6 and the Al 2 O 3 substrate 3 is sealed with the Al 2 O 3 coating film 6 F.
  • the Al 2 O 3 substrate 3 with the concave portion 3 C is glass-sealed with the low-melting glass 60 , and the groove 30 formed at the glass-sealed concave portion 3 C is coated with the Al 2 O 3 coating film 6 F. Therefore, a high bonding strength can be obtained between the Al 2 O 3 substrate 3 and the glass sealing portion 6 based on the heat contraction of the low-melting glass. Further, a high humidity resistance and deterioration resistance can be obtained by thus protecting the entire surface of the glass sealing portion 6 .

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Abstract

A light emitting device having: a flip-mounting type light emitting element; a substrate on which the light emitting element is mounted, the substrate being of an inorganic material; a sealing portion to seal the light emitting element, the sealing portion being of an inorganic sealing material; an optical-shaped portion formed nearly semispherical, the optical-shaped portion being of the inorganic sealing material; and a phosphor portion formed covering the optical-shaped portion.

Description

  • The present application is based on Japanese patent application Nos. 2005-012810 and 2005-027484, the entire contents of which are incorporated herein by reference.
    • BACKGROUND OF THE INVENTION
  • 1. Field of the Invention
  • This invention relates to a wavelength-conversion type light emitting device to wavelength-convert a light emitted from a light emitting element and, in particular, to a wavelength-conversion type light emitting device that is excellent in reliability, stable in brightness over a long term, and excellent in unevenness of emission color.
  • Further, this invention relates to a light emitting device that the light emitting element is sealed with a glass sealing material and, in particular, to a light emitting device that is excellent in mass productivity, in sealing property and deterioration resistance under a high-temperature and high-humidity environment, and in evenness of emission color.
  • Further, this invention relates to a method of making the above light emitting device.
  • 2. Description of the Related Art
  • A light emitting device is conventionally known that uses an LED (light emitting diode) element as a light source. In recent years, such a light emitting device is in wide use for an automobile lighting apparatus, a backlight light source in LCD devices, a lamp in small electronic device etc., and the other uses are also promising.
  • A semiconductor light emitting device is proposed that white light is radiated by wavelength-converting a light emitted from the LED element by a phosphor (e.g., JP-A-2004-221619, [0009], [0014] and FIG. 1 thereof)
  • The semiconductor light emitting device in JP-A-2004-221619 comprises an LED with a lens-shaped resin sealing portion, and a transparent phosphor cover which is disposed around the resin sealing portion. The LED is a GaN-based semiconductor light emitting element which has an emission peak in 430 to 480 nm. The phosphor cover comprises a thin-film resin which has an elasticity to be in close contact with the resin sealing portion, and a phosphor which radiates a fluorescent light by being excited by light emitted from the semiconductor light emitting element.
  • The semiconductor light emitting device in JP-A-2004-221619 is advantageous in that a desired emission color with high brightness can be obtained by mixing a light emitted from the semiconductor light emitting element with a light wavelength-converted by the phosphor since the phosphor cover is disposed around the resin sealing portion.
  • However, the semiconductor light emitting device in JP-A-2004-221619 has the following problems.
  • (1) It is difficult to secure its long-term reliability since the resin sealing portion and the phosphor cover deteriorate due to the light emitted from the GaN-based semiconductor light emitting element. Further, the brightness of the light emitting device lowers due to the deterioration.
  • (2) The profile accuracy of the phosphor cover and the uniformity of phosphor dispersed must be enhanced in consideration of the unevenness in emission color and the light distribution property since the light radiation characteristics of the semiconductor light emitting device are dependent on the shaping property of the resin sealing portion and the phosphor cover. Therefore, the manufacturing process will be complicated and the manufacturing cost will increase.
  • On the other hand, a resin-sealed type LED is conventionally known that an LED element is sealed with a transparent resin material such as an epoxy resin.
  • It is known that the resin-sealed type LED is subjected to a deterioration such as yellowing when the transparent resin material is reacted with intense light while it is excellent in sealing workability due to using the transparent resin material. Especially in using a group III nitride-based compound semiconductor light emitting element to emit short-wavelength light, the transparent resin material near the element can be yellowed due to high-energy light emitted from the element and heat generated from the element. Therefore, the light extraction efficiency may lower significantly.
  • To prevent the deterioration of the sealing material, a light emitting device is proposed that uses a low-melting glass as the sealing material (e.g., JP-A-11-177129, [0007] and FIG. 1 thereof).
  • FIG. 15 is a cross sectional view showing the light emitting device disclosed in JP-A-11-177129. The light emitting device 50 comprises an LED element 51, a printed-circuit board 52, a wiring pattern 53 formed on the surface of the printed-circuit board 52, a wire 54 which electrically connects between the LED element 51 and the wiring pattern 53, and the low-melting glass 55 which seals the LED element 51 and the wire 54, and has a refractive index of about 2 which is near 2.3 or so, the refractive index of a GaN-based LED element.
  • The light emitting device in JP-A-11-177129 is advantageous in that a light returned to the inside of the LED element 51 due to total reflection on the surface thereof can be reduced by sealing the LED element 51 with the low-melting glass 55 which has a refractive index close to that of the GaN-based LED element. Thus, the amount of light entering into the low-melting glass 55 after being emitted from the LED element 51 can be increased. As a result, the light extraction efficiency can be enhanced as compared to the conventional device with the LED element sealed with the epoxy resin.
  • However, the light emitting device in JP-A-11-177129 has problems in practical manufacturing and mass productivity since the low-melting glass cannot be easy processed like the epoxy resin.
  • For example, when the LED element is sealed with the glass in high-viscosity state so as to prevent the heat damage of the LED element, the wire may be deformed by the high-viscosity glass so that the electrical short-circuiting or the disconnection of wire may occur. Even when using the glass in low-viscosity state, the molding as shown in FIG. 15 is difficult to conduct. On the other hand, a resin printed-circuit board cannot endure the processing temperature, and an inorganic printed-circuit board may be broken when being pressed by a mold. Further, since the glass-sealed LED element requires an individual processing, not a batch processing due to the high-temperature processing, it cannot be applied to the mass production.
  • As described above, a phosphor white LED with a good long-term reliability is never proposed, and a glass-sealed LED with a good mass productivity is never proposed.
    • SUMMARY OF THE INVENTION
  • It is an object of the invention to provide a light emitting device that is excellent in long-term reliability so that the brightness can be stabilized over a long term, and excellent in evenness of emission color.
  • It is a further object of the invention to provide a light emitting device that is excellent in mass productivity, in sealing property and deterioration resistance under a high-temperature and high-humidity environment, and in evenness of emission color.
  • It is a further object of the invention to provide a method of making the light emitting device.
  • (1) According to one aspect of the invention, a light emitting device comprises:
  • a flip-mounting type light emitting element;
  • a substrate on which the light emitting element is mounted, the substrate comprising an inorganic material;
  • a sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material;
  • an optical-shaped portion formed nearly semispherical, the optical-shaped portion comprising the inorganic sealing material; and
  • a phosphor portion formed covering the optical-shaped portion.
  • (2) According to another aspect of the invention, a light emitting device comprises:
  • a flip-mounting type light emitting element;
  • a substrate on which the light emitting element is mounted, the substrate comprising an inorganic material;
  • a sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material;
  • an optical-shaped portion formed nearly semispherical, the optical-shaped portion comprising the inorganic sealing material; and
  • a phosphor portion formed covering the optical-shaped portion,
  • wherein the inorganic material comprises a thermal expansion coefficient equivalent to that of the light emitting element, and
  • the inorganic sealing material comprises a thermal expansion coefficient equivalent to that of the substrate and the light emitting element.
  • In the above invention (1) or (2), the following modifications and changes can be made.
  • (i) The inorganic sealing material comprises a glass material.
  • (ii) The phosphor portion comprises an inorganic material and a phosphor.
  • (iii) The phosphor portion comprises a thermal expansion coefficient greater than the sealing portion.
  • (iv) The phosphor portion comprises a dichroic mirror that a plurality of materials with different refractive indexes are alternately laminated, and a phosphor layer formed on the dichroic mirror.
  • (v) The the phosphor portion comprises a low-melting fluoride glass.
  • (vi) The optical-shaped portion comprises a dimension to define a ratio to a width of the light emitting element of 21/2 or more and 10 or less.
  • (3) According to another aspect of the invention, a light emitting device comprises:
  • a light emitting element;
  • a substrate on which the light emitting element is mounted, the substrate comprising an inorganic material;
  • a sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material; and
  • a coating portion formed covering the sealing portion,
  • wherein the sealing portion comprises a cutting face at which an interface of the inorganic sealing material and the substrate is exposed and by which the light emitting element is surrounded, and
  • the sealing portion is covered with the coating portion on an entire surface thereof.
  • (4) According to another aspect of the invention, a light emitting device comprises:
  • a light emitting element;
  • a substrate on which the light emitting element is mounted, the substrate comprising an inorganic material;
  • a sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material; and
  • a coating portion formed covering the sealing portion,
  • wherein the sealing portion comprises a cutting face by which the light emitting element is surrounded, and
  • the sealing portion is covered with the coating portion on an entire surface thereof that light emitted from the light emitting element reaches directly.
  • In the above invention (3) or (4), the following modifications and changes can be made.
  • (vii) The light emitting element comprises a flip-mounting type light emitting element, and
  • the substrate comprises the inorganic material that comprises a thermal expansion coefficient equivalent to that of the sealing portion.
  • (viii) The coating portion comprises a light-transmitting inorganic material.
  • (ix) The coating portion comprises a phosphor-containing material.
  • (x) The coating portion comprises a dichroic mirror.
  • (5) According to another aspect of the invention, a method of making a light emitting device comprises:
  • a first step that a substrate comprising an inorganic material is provided;
  • a second stet that a plurality of light emitting elements are mounted on the substrate;
  • a third step that the substrate with the plurality of light emitting elements mounted thereon is sealed with a sealing material;
  • a fourth step that a cutting portion is provided in the sealing material;
  • a fifth step that a coating is formed on a surface of the sealing material including an exposed portion formed by providing the cutting portion; and
  • a sixth step that the substrate with the sealing material is separated along the cutting potion.
  • In the above invention (5), the following modifications and changes can be made.
  • (xi) The coating in the fifth step is formed by sputtering.
  • (xii) The coating in the fifth step is formed by electrostatic coating.
    • ADVANTAGES OF THE INVENTION
  • According to the invention, since the light emitting element and the substrate both made of the inorganic material are sealed with the inorganic sealing material, the sealing property and reliability can be enhanced. Further, deterioration caused by light emitted from the light emitting element can be suppressed, and a stable brightness can be kept without unevenness in emission color over a long term.
  • Furthermore, since the sealing portion and the substrate are covered with the light-transmitting inorganic coating portion, the water resistance of the sealing portion can be enhanced and a good adhesion between the substrate and the sealing portion can be secured. Further, even in high humidity environment, it can have a good sealing property and deterioration resistance.
    • BRIEF DESCRIPTION OF THE DRAWINGS
  • The preferred embodiments according to the invention will be explained below referring to the drawings, wherein:
  • FIG. 1A is a cross sectional view showing a light emitting device (herein also called LED) in a first preferred embodiment according to the invention;
  • FIG. 1B is a schematic diagram illustrating light radiation on the surface of a glass sealing portion;
  • FIGS. 2A to 2E are cross sectional views showing a method of making the LED in the first embodiment;
  • FIG. 3 is a cross sectional view showing a light emitting device in a second preferred embodiment according to the invention;
  • FIG. 4 is a cross sectional view showing a light emitting device in a third preferred embodiment according to the invention;
  • FIG. 5A is a plain view showing an LED in a fifth preferred embodiment according to the invention;
  • FIG. 5B is a cross sectional view cut along a line B-B in FIG. 5A;
  • FIG. 6A is a cross sectional view showing an LED lamp in a sixth preferred embodiment according to the invention;
  • FIG. 6B is a cross sectional view showing: a light-emitting portion mounted on the LED lamp in FIG. 6A;
  • FIG. 7 is a cross sectional view showing a light emitting device in a seventh preferred embodiment according to the invention;
  • FIG. 8A to 8C are cross sectional views showing a wiring formation step to a glass preparation step in a method of making the LED in FIG. 7;
  • FIG. 9A to 9D are cross sectional views showing a glass sealing step to an LED separation step in the method of making the LED in FIG. 7;
  • FIG. 10 is a cross sectional view showing a light emitting device in an eighth preferred embodiment according to the invention;
  • FIG. 11 is a cross sectional view showing a light emitting device (LED) in a ninth preferred embodiment according to the invention;
  • FIG. 12A to 12C are cross sectional views showing a wiring formation step to a glass preparation step in a method of making the LED in FIG. 11;
  • FIG. 13A to 13C are cross sectional views showing a glass sealing step to an LED separation step in the method of making the LED in FIG. 11;
  • FIG. 14A to 14D are cross sectional views showing a glass sealing step to an LED separation step in a method of making a concave groove in an LED in a tenth preferred embodiment according to the invention; and
  • FIG. 15 is a cross sectional view showing the conventional light emitting device in JP-A-11-177129.
    • DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS First Embodiment
  • FIG. 1A is a cross sectional view showing a light emitting device in the first preferred embodiment according to the invention. FIG. 1B is a schematic diagram illustrating light radiation on the surface of a glass sealing portion.
  • Components of the Device
  • As shown in FIG. 1A, the LED 1 comprises: a flip-chip type LED element 2; an Al2O3 substrate 3, as an inorganic material substrate, provided with circuit patterns 4A, 4B, and via holes 3A; an Au bump 5 to electrically connect between the circuit pattern 4B and an electrode of the LED element 2; and a glass sealing portion 6 that is made of an inorganic sealing material to seal the Al2O3 substrate 3 and the LED element 2 and is provided with an optical-shaped portion 6A formed semispherical.
  • (Details of the Components)
  • The LED element 2 comprises, sequentially grown on an underlying sapphire substrate, an AlN buffer layer and a GaN-based semiconductor layer including an n-GaN layer, a light-emitting layer, and a p-GaN layer. It has a horizontal type electrode structure that a part of the n-GaN layer is exposed as an n-electrode formation region by etching the p-GaN layer through the n-GaN layer. It is flip-chip mounted on the circuit pattern 4B through the Au bump 5. The LED element 2 has a central emission wavelength of about 470 nm and a thermal expansion coefficient of 7×10−6/° C. The ratio of the width of the optical-shaped portion 6A of the LED 1 and the width (i.e., the maximum width, the length of a diagonal line in case of a square) of the LED element 2 is determined to be 21/2 or more and 10 or less.
  • The Al2O3 substrate 3 has a thermal expansion coefficient of 7×10−6/° C., which is nearly equivalent to that of the LED element 2. It is provided with the circuit patterns 4A, 4B and the via pattern 4C which are made of tungsten (W)—nickel (Ni)—gold (Au).
  • The glass sealing portion 6 is made of low-melting glass which can be processed by hot pressing at a low melting point of 600° C. or less, and it has a thermal expansion coefficient (7×10−6/° C.) nearly equivalent to that of the LED element 2 and the Al2O3 substrate 3. It is, on its surface, provided with the optical-shaped portion 6A which is formed semispherical, and a phosphor film 6B which is formed, as a phosphor portion, on the surface of the optical-shaped portion 6A.
  • The phosphor film 6B is formed by coating an acrylic coating material containing Ce:YAG (yttrium aluminum garnet) phosphor on the surface of the optical-shaped portion 6A and then drying it. As shown in FIG. 1B, light Lb reaching the phosphor film 6B while transmitting the glass sealing portion 6 is irradiated to the phosphor and, thereby, yellow lights Lb1 to Lb3 are radiated from the phosphor.
  • (Method of Making the LED 1)
  • A method of making the LED 1 of the first embodiment will be described below.
  • FIGS. 2A to 2E are cross sectional views showing the method of making the LED 1 in the first embodiment. Hereinafter, the Al2O3 substrate 3 is used which is previously provided with a V groove 3G for separation and a via hole.
  • (Wiring Formation Step)
  • As shown in FIG. 2A, a W paste is screen-printed on the Al2O3 substrate 3 according to the circuit pattern. Then, the Al2O3 substrate 3 with the W paste printed thereon is heated at 1500° C. to burn the W onto the Al2O3 substrate 3. Then, Ni plating and Au plating are provided on the W to form the circuit patterns 4A, 4B and the via pattern 4C.
  • (LED Element Mounting Step)
  • Then, as shown in FIG. 2B, the LED element 2 is flip-mounted through the Au bump 5 on the circuit pattern 4B of the Al2O3 substrate 3.
  • (Low-Melting Glass Preparation Step)
  • Then, as shown in FIG. 2C, a plate-like P2O5—ZnO—Li2O-based low-melting glass 60 is parallel placed over the Al2O3 substrate 3.
  • (Glass Sealing Step)
  • Then, as shown in FIG. 2D, the low-melting glass 60 is hot-pressed at 550 to 500° C. in a nitrogen atmosphere. The low-melting glass 60 is bonded to the surface of the substrate through oxides contained in the Al2O3 substrate 3 and the glass, and the glass sealing portion 6 is molded to have the semispherical optical-shaped portion 6A according to the form of a pressing mold.
  • (Phosphor Film Formation Step)
  • Then, as shown in FIG. 2E, with the plural LED's 1 formed in an array, the phosphor-containing acrylic coating material is coated on the surface of the glass sealing portion 6 and then dried to form the phosphor film 6B on the surface of the glass sealing portion 6.
  • Then, the LED 1 is separated by cutting the Al2O3 substrate 3 along the V groove 3G.
  • (Operation of the LED 1)
  • The operation of the first embodiment will be described below.
  • When current is fed through the circuit pattern 4A from a power supply (not shown), the light-emitting layer is current-fed through the electrode of the LED element 2. Thereupon, the light-emitting layer emits blue light. The blue light is inputted from the GaN-based semiconductor layer through the sapphire substrate to the glass sealing portion 6, reaching the optical-shaped portion 6A. The blue light reaching the optical-shaped portion 6A is then inputted to the phosphor film 6B. Thereupon, the phosphor contained in the phosphor film 6B radiates yellow light while being excited by the inputted blue light. Thereupon, white light is generated by mixing the yellow light with the blue light, and externally radiated from the phosphor film 6B.
    • Effects of the First Embodiment
  • The effects of the first embodiment are as follows.
  • (1) Since the LED element 2 is sealed with the glass sealing portion 6 with the semispherical optical-shaped portion 6A, deterioration in the sealing material due to the self-heating or self-irradiating of the LED element 2 does not occur so that the LED 1 can have an excellent sealing property of the LED element 2 and a stable brightness over a long term. Further, the bonding strength between the glass sealing portion 6 and the Al2O3 substrate 3 can be enhanced since they have an equivalent thermal expansion coefficient each other, different from the case of using the resin sealing material. Thus, the small LED 1 can be obtained with a high reliability.
  • (2) The phosphor film 6B is disposed at a suitable distance from the light extracting surface (i.e., bottom of the sapphire substrate) of the LED element 2, and the phosphor film 6B is provided with a uniform thickness. Thereby, even in case of the downsized LED 1, unevenness in emission color can be prevented as compared to the case of a phosphor-dispersed type which is likely to have unevenness in emission color caused by a difference in optical path length inside the phosphor layer. For example, in the phosphor-dispersed type, light with a long optical path length is shifted to yellow since it has a long distance to transmit the phosphor layer, and light with a short optical path length is likely to be blue since it has a short distance to transmit the phosphor layer. Thus, in this embodiment, the difference in optical path length can be substantially removed by forming the uniform thin-film phosphor layer on the surface of the optical-shaped portion 6A.
  • The optical-shaped portion 6A is formed nearly semispherical so as to allow the suitable distance from the LED element 2 to the phosphor film 6B so that lights emitted from the LED element 2 in any directions have a substantially even incident angle, around the perpendicular incident angle, to the optical-shaped portion 6A. By configuring thus, interface reflection loss at the optical-shaped portion 6A can be minimized such that light reflected on the surface of the optical-shaped portion 6A or on the phosphor film 6B is absorbed again by the LED element 2. Further, since the incident angle to the phosphor film 6B can be substantially uniformed, unevenness in emission color can be prevented. Further, since unevenness in emission color or reduction in light extraction efficiency can be prevented even in case of the downsized LED 1, the amount of phosphor used can be reduced and, thereby, the manufacturing cost can be reduced.
  • (3) The phosphor film 6B can be formed by coating the phosphor-containing acrylic coating material on the plural LED's 1 disposed on the substrate. Thus, the good phosphor film 6B can be formed together on the plural LED's 1 to enhance the productivity. Further, since the acrylic resin is excellent in light resistance, deterioration in the phosphor film 6B can be prevented.
  • Although in the first embodiment the LED 1 is separated through the V groove 3G formed on the Al2O3 substrate 3, the LED LED 1 may be diced by using a dicer.
  • The LED element 2 mounted on the Al2O3 substrate 3 may be a GaP-based or GaAs-based LED element other than the GaN-based LED element.
  • The phosphor can be chosen from phosphors to be excited by the emission wavelength of an LED element used.
  • The optical-shaped portion 6A is intended not to focusing of light but to external light radiation with high efficiency and good evenness in emission color. If the focusing characteristic is required, a focusing optical system can be provided such that the LED 1 is further resin-molded.
  • The ratio of the width of the optical-shaped portion 6A and the width of the LED element 2 is preferably 5 or less although it depends on the sealing material, the bonding strength to the substrate and the damage under processing conditions etc.
    • Second Embodiment
  • FIG. 3 is a cross sectional view showing a light emitting device in the second preferred embodiment according to the invention. Hereinafter, like components are indicated by the same numerals used in the first embodiment.
  • (Components of the Device)
  • The LED 1 of the second embodiment is different from that of the first embodiment in that a phosphor-containing glass layer 6C is used in place of the phosphor film 6B of the first embodiment.
  • (Details of the Components)
  • The phosphor-containing glass layer 6C is made of a mixture material (with a melting point of about 300° C.) that a phosphor particle with an average outside diameter of 10 μm is mixed with a fluoride low-melting glass particle with an average outside diameter of 10 μm. The phosphor-containing glass layer 6C is formed integrally on the surface of the glass sealing portion 6 with the optical-shaped portion 6A by conducting the electrostatic coating of the mixture material while heating the glass sealing portion 6 at 300° C. and applying a voltage thereto and then heating it at 350° C.
    • Effects of the Second Embodiment
  • In the second embodiment, since it is glass-sealed, the electrostatic coating can be conducted by applying the voltage thereto while heating it. Further, since the mixture material of the phosphor particle and the fluoride low-melting glass particle is electrostatically adhered to the surface of the glass sealing portion 6, an effect other than the effects of the first embodiment can be obtained that the mixture material can be, with a uniform film thickness, adhered to the uneven surface of the glass sealing portion 6 and the phosphor-containing glass layer 6C with a uniform thickness can be easy formed by fusion bonding. Further, since the fluoride coating of fluoride low-melting glass is formed on the surface of the glass sealing portion 6, the humidity resistance of the LED 1 can be further enhanced.
  • Glass materials are likely to be cracked due to difference of thermal expansion coefficient. However, since the fluorine low-melting glass with a thermal expansion coefficient greater than the glass sealing portion 6 is adhered onto the semispherical glass sealing portion 6, stress in a direction likely to cause the cracking can be suppressed when it is cooled to room temperature from the melted state free of stress. Namely, it is composed such that only compressive stress is generated except tensile stress and shear stress. In this regard, the fluorine low-melting glass with the phosphor particle contained therein needs to have a thermal expansion coefficient greater than the glass sealing portion 6.
    • Third Embodiment
  • FIG. 4 is a cross sectional view showing a light emitting device in the third preferred embodiment according to the invention.
  • (Components of the Device)
  • The LED 1 of the third embodiment is different from that of the first embodiment in that a dichroic mirror 6D is formed between the glass sealing portion 6 and the phosphor film 6B such that it prevents the re-entering of light radiated from the phosphor to the glass sealing portion 6.
  • (Details of the Components)
  • The dichroic mirror 6D is formed by laminating alternately TiO2 film and SiO2 film and severs to transmit light of less than 500 nm and to reflect light of more than 500 nm. Thus, the dichroic mirror 6D can transmit blue light of 470 nm emitted from the LED element 2 and reflect yellow light radiated from the phosphor of the phosphor film 6B to prevent the re-entering thereof to the glass sealing portion 6.
    • Effects of the Third Embodiment
  • In the third embodiment, the brightness can be enhanced in addition to the effects of the first embodiment since the dichroic mirror 6D is provided between the glass sealing portion 6 and the phosphor film 6B. Namely, it can be prevented that the yellow light radiated from the phosphor film 6B is re-entered to the glass sealing portion 6 and absorbed in the LED element 2 to reduce the light extraction efficiency of the LED 1.
  • Further, since the TiO2 film and SiO2 film also are a humidity-resistant coating material, the humidity resistance of the device can be further enhanced.
    • Fourth Embodiment
  • The fourth embodiment is constructed such that the phosphor film 6B is formed by sputtering on the optical-shaped portion 6A of the LED 1 as described in the third embodiment.
    • Effects of the Fourth Embodiment
  • In the fourth embodiment, by forming the phosphor film 6B by sputtering, the phosphor film 6B can have a high phosphor concentration with high accuracy and, therefore, can have the same effects as the third embodiment. As compared to the third embodiment, yellow light generated from the phosphor film 6B is more likely to be radiated to the direction of the glass sealing portion 6 due to the high phosphor concentration. However, since the dichroic mirror 6D can reflect the yellow light being radiated to the direction of the glass sealing portion 6, the mixing of the yellow light and blue light can be promoted to obtain white light without unevenness in emission color.
    • Fifth Embodiment
  • FIG. 5A is a plain view showing an LED in the fifth preferred embodiment according to the invention. FIG. 5B is a cross sectional view cut along a line B-B in FIG. 5A.
  • (Components of the Device)
  • The fifth embodiment is different from the third embodiment in that the LED 1 is provided with plural light-emitting portions 10 of 9=3×3 which have as a light source a ultraviolet LED element 2 with a central emission wavelength of 370 nm formed on the Al2O3 substrate 3, the dichroic mirror 6D is formed covering the surface of the plural light-emitting portions 10, and the phosphor film 6B is further formed on the surface.
  • (Details of the Components)
  • The Al2O3 substrate 3 is provided with a heat-radiating pattern 4D that is made of copper foil and allows heat generated from the plural LED elements 2 to be radiated outside of the substrate.
  • The phosphor film 6B contains R, G and B phosphors at a predetermined ratio to be excited by ultraviolet light emitted from the LED element 2, and it radiates white light based on the mixing of R, G and B visible lights generated by being excited.
  • The dichroic mirror 6D is formed by laminating alternately Ta2O5 film and SiO2 film and severs to transmit ultraviolet light emitted from the LED element 2 and to reflect the R, G and B visible lights radiated from the phosphor film 6B to prevent the re-entering thereof to the glass sealing portion 6.
    • Effects of the Fifth Embodiment
  • In the fifth embodiment, the plural light-emitting portions 10 are formed on the Al2O3 substrate 3 with the ultraviolet LED element 2 having high emission efficiency and the phosphor film 6B containing the R, G and B phosphors. Therefore, the LED 1 can radiate white light with a color rendering property at high brightness, in addition to the effects of the third embodiment.
  • Further, even when the ultraviolet LED element 2 is used, the sealing material does not deteriorate since the LED 1 is sealed with the glass sealing portion 6. Thus, the LED 1 can have a high reliability over a long term while using the ultraviolet LED element 2 with the high emission efficiency as a light source.
  • Although the LED 1 of the fifth embodiment has the nine light-emitting portions 10 formed on the Al2O3 substrate 3, the number of the light-emitting portions 10 may be changed.
    • Sixth Embodiment
  • FIG. 6A is a cross sectional view showing an LED lamp in the sixth preferred embodiment according to the invention. FIG. 6B is a cross sectional view showing a light-emitting portion mounted on the LED lamp in FIG. 6A.
  • (Components of the Device)
  • The LED lamp 100 comprises a case 20 made of nylon resin, a light-emitting portion 10 mounted on an element mounting surface 21 formed at the bottom of a concave portion of the case 20, a phosphor film 22A which covers an opening of the case 20 and contains R, G and B phosphors, and a dichroic mirror 23 which is laminated on the phosphor film 22A. The dichroic mirror 23 serves to transmit visible light and to reflect ultraviolet light. The light-emitting portion 10 comprises the ultraviolet LED element 2 as a light source, and the dichroic mirror 6D formed on the optical-shaped portion 6A to transmit visible light and to reflect ultraviolet light.
  • The case 20 comprises a reflection surface 22 formed curved from the element mounting surface 21 to the opening of the case 20, a circuit pattern 24A formed on the bottom of the case 20 for external circuit connection, a circuit pattern 24B formed on the element mounting surface 21 for the mounting of the light-emitting portion 10, and an internal wiring pattern 24C to connect between the circuit pattern 24A and the circuit pattern 24B.
  • (Operation of the LED Lamp 100)
  • The operation of the sixth embodiment will be described below.
  • When current is fed through the circuit pattern 24A from a power supply (not shown), the light-emitting layer is current-fed through the electrode of the LED element 2. Thereupon, the light-emitting layer emits blue light. The blue light is inputted from the GaN-based semiconductor layer through the sapphire substrate to the glass sealing portion 6, reaching the optical-shaped portion 6A. The blue light reaching the optical-shaped portion 6A is then transmitted through the dichroic mirror 6D, radiated outside of the light-emitting portion 10.
  • Light radiated laterally from the light-emitting portion 10 is inputted to the phosphor film 22A formed on the reflection surface 22, exciting the R, G and B phosphors therein and then reflected in directions according to the curved face of the reflection surface 22. The reflected light is mixed with ultraviolet light transmitted through the dichroic mirror 6D of the light-emitting portion 10 to generate visible light. The visible light is transmitted through the dichroic mirror 23 and radiated outside of the case 20.
  • On the other hand, light radiated upward from the optical fiber main body 10 is inputted to the phosphor film 22A covering the case 20, exciting the R, G and B phosphors therein. Excited light radiated from the R, G and B phosphors is mixed with ultraviolet light transmitted through the dichroic mirror 6D of the light-emitting portion 10 to generate visible light. The visible light is transmitted through the dichroic mirror 23 and radiated outside of the case 20.
    • Effects of the Sixth Embodiment
  • In the sixth embodiment, although the phosphor film 22A is formed on the side of the case 20 while being separated from the light-emitting portion 10, the LED lamp 100 can have high brightness and reliability without unevenness in emission color.
  • The ultraviolet LED element 2 may be replaced by the blue LED element 2 and the R, G and B phosphors contained in the phosphor film 22A may be replaced by a yellow phosphor such as YAG. Thereby, white light can be radiated outside of the LED lamp 100.
    • Seventh Embodiment
  • FIG. 7 is a cross sectional view showing a light emitting device in the seventh preferred embodiment according to the invention.
  • (Components of the Device)
  • As shown in FIG. 7, the LED 1 comprises: a flip-chip type LED element 2; an Al2O3 substrate 3, as an inorganic material substrate, provided with circuit patterns 4A, 4B, and via holes 3A; an Au bump 5 to electrically connect between the circuit pattern 4B and an electrode of the LED element 2; and a glass sealing portion 6 that is made of an inorganic sealing material to seal the Al2O3 substrate 3 and the LED element 2.
  • (Details of the Components)
  • The LED element 2 comprises, sequentially grown on an underlying sapphire substrate, an AlN buffer layer and a GaN-based semiconductor layer including an n-GaN layer, a light-emitting layer, and a p-GaN layer. It has a horizontal type electrode structure that a part of the n-GaN layer is exposed as an n-electrode formation region by etching the p-GaN layer through the n-GaN layer. It is flip-chip mounted on the circuit pattern 4B through the Au bump 5. The LED element 2 has a central emission wavelength of about 470 nm and a thermal expansion coefficient of 7×10−6/° C. The ratio of the width of the LED 1 and the width of the LED element 2 is determined to be 1 or more and 5 or less.
  • The Al2O3 substrate 3 has a thermal expansion coefficient of 7×10−6/° C., which is nearly equivalent to that of the LED element 2. It is provided with the circuit patterns 4A, 4B and the via pattern 4C which are made of tungsten (W)—nickel (Ni)—gold (Au) on its element mounting surface, via hole 3A and bottom surface. Further, it is provided with a step portion 3B at a portion corresponding to an outer edge of the LED 1.
  • The glass sealing portion 6 is made of low-melting glass which can be processed by hot pressing at a low melting point of 600° C. or less, and it has a thermal expansion coefficient (7×10−6/° C.) nearly equivalent to that of the LED element 2 and the Al2O3 substrate 3. It is, on its surface, provided with the optical-shaped portion 6A which is formed semispherical, and an Al2O3 coating film 6F which is formed on the surface of the optical-shaped portion 6A.
  • The Al2O3 coating film 6F is formed by sputtering Al2O3 on the surface of the optical-shaped portion 6A and then drying it. The Al2O3 coating film 6F is provided with an end-face protecting portion 6E which covers the end face of the glass sealing portion 6 and the step portion 3B.
  • (Method of Making the LED 1)
  • A method of making the LED 1 of the seventh embodiment will be described below.
  • FIG. 8A to 8C are cross sectional views showing a wiring formation step to a glass preparation step in the method of making the LED in FIG. 7. FIG. 9A to 9D are cross sectional views showing a glass sealing step to an LED separation step in the method of making the LED in FIG. 7.
  • (Wiring Formation Step)
  • As shown in FIG. 8A, a W paste is screen-printed on the Al2O3 substrate 3 according to the circuit pattern. Then, the Al2O3 substrate 3 with the W paste printed thereon is heated at 1500° C. to burn the W-onto the Al2O3 substrate 3. Then, Ni plating and Au plating are provided on the W to form the circuit patterns 4A, 4B and the via pattern 4C.
  • (LED Element Mounting Step)
  • Then, as shown in FIG. 8B, the LED element 2 is flip-mounted through the Au bump 5 on the circuit pattern 4B of the Al2O3 substrate 3.
  • (Low-Melting Glass Preparation Step)
  • Then, as shown in FIG. 8C, a plate-like P2O5—ZnO—Li2O-based low-melting glass 60 is parallel placed over the Al2O3 substrate 3.
  • (Glass Sealing Step)
  • Then, as shown in FIG. 9A, the low-melting glass 60 is hot-pressed at 550 to 500° C. in a nitrogen atmosphere. The low-melting glass 60 is bonded to the surface of the substrate through oxides contained in the Al2O3 substrate 3 and the glass, and the glass sealing portion 6 is molded to have the semispherical optical-shaped portion 6A according to the form of a pressing mold.
  • (Groove Formation Step)
  • Then, as shown in FIG. 9B, a groove 30 is formed by half-cutting a thin portion of the glass sealing portion 6 by using a dicing saw. The groove 30 has such a depth that can prevent the separation of the Al2O3 substrate 3. In this state, the interface of the glass sealing portion 6 and the Al2O3 substrate 3 is exposed, and a part corresponding to the LED 1 is, in plain view thereof, surrounded by the groove 30 as a cutting face.
  • (Coating Film Formation Step)
  • Then as shown in FIG. 9C, the Al2O3 coating film 6F is formed by sputtering to cover the surface of the glass sealing portion 6. In this state, the entire surface of the part corresponding to the LED 1 surrounded by the groove 30 is covered with the Al2O3 coating film 6F.
  • (LED Separation Step)
  • Then, as shown in FIG. 9D, the LED 1 is separated by cutting the Al2O3 substrate 3 along the groove 30. The LED 1 separated has the end face of the glass sealing portion 6 covered with the Al2O3 coating film.
  • (Operation of the LED 1)
  • The operation of the seventh embodiment will be described below.
  • When current is fed through the circuit pattern 4A from a power supply (not shown), the light-emitting layer is current-fed through the electrode of the LED element 2. Thereupon, the light-emitting layer emits blue light. The blue light is inputted from the GaN-based semiconductor layer through the sapphire substrate to the glass sealing portion 6, reaching the optical-shaped portion 6A. The blue light reaching the optical-shaped portion 6A is externally radiated through the Al2O3 coating film 6F.
    • Effects of the Seventh Embodiment
  • The effects of the seventh embodiment are as follows.
  • (1) After the LED element 2 is seal with glass, the grove 30 is formed penetrating through the glass sealing portion 6 into the Al2O3 substrate 3, and the Al2O3 coating film 6F is formed on the surface of the glass as well as the groove 30 to protect the surface of the glass. Therefore, even when the LED 1 is separated, the end face of the glass sealing portion 6 can be thereby protected without being exposed. Thus, even when the glass sealing portion 6 has a relatively low humidity resistance due to its restrictions such as reduction in glass melting point, adjustment in thermal expansion coefficient or refractive index etc., the glass sealing portion 6 can be stably used over a long term without deteriorating under high temperature and humidity environment.
  • Further, since the Al2O3 coating film 6F is formed by sputtering, it can be easy formed in the groove 30.
  • (2) Since moisture does not penetrate through between the glass sealing portion 6 and the A2O3 substrate 3 due to the Al2O3 coating film 6F, reduction in bonding strength between the glass sealing portion 6 and the Al2O3 substrate 3 can be prevented.
  • (3) Since the groove 30 is formed by the half-cutting with the dicing saw after the formation of the glass sealing portion 6, the LED 1 can be easy separated after the formation of the Al2O3 coating film 6F. Thus, the productivity can be enhanced.
  • Although in the seventh embodiment the Al2O3 coating film 6F is formed on the surface of the glass sealing portion 6, the coating film 6F may be made of SiO2, SiN, MgF2 etc. other than Al2O3.
  • Although in the seventh embodiment the groove 30 is formed by using the dicing saw, the groove 30 may be formed by laser light. The laser processing allows reduction in process time and enhancement in productivity. Especially short-time pulse irradiation such as femtosecond laser pulse allows the formation of a smooth-faced groove.
  • It is confirmed by experiments that glass can be well bonded to the Al2O3 when it has a thermal expansion coefficient of 6.9×10−6/° C. to 7.7×10−6/° C. Although the bonding strength depends on the size, melting characteristic and stress direction of glass, it does not always need to have a difference in thermal expansion coefficient within a few %. Thus, even when the difference is about 15%, it only has to have a sufficient bonding strength.
    • Eighth Embodiment
  • FIG. 10 is a cross sectional view showing a light emitting device in the eighth preferred embodiment according to the invention. Like components are indicated by the same numerals used in the seventh embodiment.
  • (Components of the Device)
  • The LED 1 of the eighth embodiment is different from that of the seventh embodiment in that a dichroic mirror 6D and a phosphor-containing glass layer 6C are used place of the Al2O3 coating film 6F.
  • (Details of the Components)
  • The dichroic mirror 6D is formed by laminating alternately TiO2 film and SiO2 film and severs to transmit light of less than 500 nm and to reflect light of more than 500 nm. Thus, the dichroic mirror 6D can transmit blue light of 470 nm emitted from the LED element 2 and reflect yellow light radiated-from the phosphor of the phosphor-containing glass layer 6C to prevent the re-entering thereof to the glass sealing portion 6.
  • The phosphor-containing glass layer 6C is made of a mixture material (with a melting point of about 300° C.) that a phosphor particle with an average outside diameter of 10 μm is mixed with a fluoride low-melting glass particle with an average outside diameter of 10 μm. The phosphor-containing glass layer 6C is formed integrally on the surface of the glass sealing portion 6C is formed integrally on the surface of the glass sealing electrostatic coating of the mixture material while heating glass sealing portion 6 at 300° C. and applying a voltage thereto and then heating it at 350° C. In this case, the phosphor used is to be excited by blue light emitted from the LED element 2. For example, the phosphor can be Ce:YAG (yttrium aluminum garnet) phosphor.
    • Effects of the Eighth Embodiment
  • In the eighth embodiment, since the dichroic mirror 6D and the phosphor-containing glass layer 6C are formed on the entire surface of the glass sealing portion 6, unevenness in emission color can be suppressed.
  • Further, since it is glass-sealed, the electrostatic coating can be conducted by applying the voltage thereto while heating it. Further, since the mixture material of the phosphor particle and the fluoride low-melting glass particle is electrostatically adhered to the surface of the glass sealing portion 6, an effect other than the effects of the seventh embodiment can be obtained that the mixture material can be, with a uniform film thickness, adhered to the uneven surface of the glass sealing portion 6 and the phosphor-containing glass layer 6C with a uniform thickness can be easy formed by fusion bonding.
  • Further, since the fluoride coating of fluoride low-melting glass is formed on the surface of the glass sealing portion 6, the humidity resistance of the LED 1 can be further enhanced.
    • Ninth Embodiment
  • FIG. 11 is a cross sectional view showing a light emitting device (LED) in the ninth preferred embodiment according to the invention.
  • (Components of the Device)
  • The LED 1 of the ninth embodiment is different from that of the seventh or eighth embodiment in that it is provided with the Al2O3 substrate 3 having a concave portion 3C with a height different from the element mounting surface, the glass sealing portion 6 is formed covering the concave portion 3C as well as the Al2O3 substrate 3 and the LED element 2, and that it is provided with only the phosphor-containing glass layer 6C instead of the Al2O3 coating film 6F and the dichroic mirror 6D.
  • (Details of the Components)
  • The glass sealing portion 6 is formed by hot pressing to cover the concave portion 3C as well as having the optical-shaped portion 6A. The phosphor-containing glass layer 6C as described in the eighth embodiment is formed on the surface of the glass sealing portion 6.
  • (Method of Making the LED 1)
  • A method of making the LED 1 of the ninth embodiment will be described below.
  • FIG. 12A to 12C are cross sectional views showing a wiring formation step to a glass preparation step in the method of making the LED in FIG. 11. FIG. 13A to 13C are cross sectional views showing a glass sealing step to an LED separation step in the method of making the LED in FIG. 11.
  • (Wiring Formation Step)
  • As shown in FIG. 12A, a W paste is, according to the circuit pattern, screen-printed on the Al2O3 substrate 3. Then, the Al2O3 substrate 3 with the W paste printed thereon is heated at 1500° C. to burn the W onto the Al2O3 substrate 3. Then, Ni plating and Au plating are provided on the W to form the circuit patterns 4A, 4B and the via pattern 4C. The concave portion 3C is formed by cutting or sand-blasting after the formation of the circuit patterns 4A, 4B and the via pattern 4C. Alternatively, it may be formed before the formation.
  • (LED Element Mounting Step)
  • Then, as shown in FIG. 12B, the LED element 2 is flip-mounted through the Au bump 5 on the circuit pattern 4B of the Al2O3 substrate 3.
  • (Low-Melting Glass Preparation Step) Then, as shown in FIG. 12C, a plate-like P2O5—ZnO—Li2O-based low-melting glass 60 is parallel placed over the Al2O3 substrate 3.
  • (Glass Sealing Step)
  • Then, as shown in FIG. 13A, the low-melting glass 60 is hot-pressed at 550 to 500° C. in a nitrogen atmosphere. The low-melting glass 60 is bonded to the surface of the substrate through oxides contained in the Al2O3 substrate 3 and the glass, and the glass sealing portion 6 is molded to have the semispherical optical-shaped portion 6A according to the form of a pressing mold. In this stage, the glass sealing portion 6 is provided with a concave groove 6G which is a thin portion corresponding to the concave portion 3C.
  • (Coating Film Formation Step)
  • Then, as shown in FIG. 13B, the phosphor-containing glass layer 6C is formed.
  • (LED Separation Step)
  • Then, as shown in FIG. 13C, the LED 1 is separated by cutting the substrate along the concave groove 6G by using a dicer.
    • Effects of the Ninth Embodiment
  • In the ninth embodiment, the Al2O3 substrate 3 with the concave portion 3C formed thereon is sealed with the low-melting glass 60, the low-melting glass 60 is concave-convex sealed in close contact with the side face of the concave portion 3C based on internal stress to be generated by heat contraction of the low-melting glass 60. Thus, since the glass sealing portion 6 is in close contact with the glass sealing portion 6 at the edge of the LED 1, the separation of glass or the penetration of moisture can be very effectively prevented.
  • Although in the ninth embodiment the glass sealing portion 6 is slightly exposed at the end-face protecting portion 6E, the optical influence thereof is negligible such that unevenness in emission color does not occur since light emitted from the LED element 2 does not reach directly this portion. Meanwhile, in this case, the glass sealing portion 6 is desirably of a material with high humidity resistance.
  • Optionally, the Al2O3 coating film may be formed in addition to the phosphor-containing glass layer 6C. Glass may be clouded at its surface in a high temperature and humidity environment. However, when the Al2O3 coating film is formed on the glass surface that light emitted from the LED element 2 reaches directly, the optical characteristics do not change.
    • Tenth Embodiment
  • FIG. 14A to 14D are cross sectional views showing a glass sealing step to an LED separation step in a method of making a concave groove in an LED in the tenth preferred embodiment according to the invention.
  • (Components of the Device)
  • The tenth embodiment is constructed such the glass sealing portion 6 is prevented from being exposed at the concave portion 3C as described in the ninth embodiment.
  • (Method of Making the Device)
  • The method of making the concave groove in the LED will be described below.
  • (Glass Sealing Step)
  • As shown in FIG. 14A, the glass sealing step is conducted such that the concave groove 6G corresponding to the concave portion 3C has a groove width not to disturb the groove shaping process as described later. The other process is the same as described in the glass sealing step in FIG. 13A.
  • (Groove Formation Step)
  • As shown in FIG. 14B, the groove formation step is conducted such that the groove 30 is formed by irradiating laser light to the concave groove 6G of the glass sealing portion 6 to allow the Al2O3 substrate 3 to be exposed. Instead of the irradiation of the laser light, the dicing with a dicer may be conducted to form the groove 30 with a depth reaching the Al2O3 substrate 3.
  • (Coating Film Formation Step)
  • As shown in FIG. 14C, the coating film formation step is conducted such that the Al2O3 coating film 6F is formed covering the Al2O3 substrate 3 exposed in the groove formation step so as to coat the concave groove 6G exposed by the irradiation of the laser light.
  • (LED Separation Step)
  • As shown in FIG. 14D, the LED separation step is conducted such that LED 1 is individually separated by cutting the substrate at the groove 30 by a dicer after the coating film formation step. The end-face of the separated LED 1 is concave-convex sealed with the glass sealing portion 6 at the concave portion 3C of the Al2O3 substrate 3, and the interface of the glass sealing portion 6 and the Al2O3 substrate 3 is sealed with the Al2O3 coating film 6F.
    • Effects of the Tenth Embodiment
  • In the tenth embodiment, the Al2O3 substrate 3 with the concave portion 3C is glass-sealed with the low-melting glass 60, and the groove 30 formed at the glass-sealed concave portion 3C is coated with the Al2O3 coating film 6F. Therefore, a high bonding strength can be obtained between the Al2O3 substrate 3 and the glass sealing portion 6 based on the heat contraction of the low-melting glass. Further, a high humidity resistance and deterioration resistance can be obtained by thus protecting the entire surface of the glass sealing portion 6.
  • Although the invention has been described with respect to the specific embodiments for complete and clear disclosure, the appended claims are not to be thus limited but are to be construed as embodying all modifications and alternative constructions that may occur to one skilled in the art which fairly fall within the basic teaching herein set forth.

Claims (17)

1. A light emitting device, comprising:
a flip-mounting type light emitting element;
a substrate on which the light emitting element is mounted, the substrate comprising an inorganic material;
a sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material;
an optical-shaped portion formed nearly semispherical, the optical-shaped portion comprising the inorganic sealing material; and
a phosphor portion formed covering the optical-shaped portion.
2. A light emitting device, comprising:
a flip-mounting type light emitting element;
a substrate on which the light emitting element is mounted, the substrate comprising an inorganic material;
a sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material;
an optical-shaped portion formed nearly semispherical, the optical-shaped portion comprising the inorganic sealing material; and
a phosphor portion formed covering the optical-shaped portion,
wherein the inorganic material comprises a thermal expansion coefficient equivalent to that of the light emitting element, and
the inorganic sealing material comprises a thermal expansion coefficient equivalent to that of the substrate and the light emitting element.
3. The light emitting device according to claim 1, wherein:
the inorganic sealing material comprises a glass material.
4. The light emitting device according to claim 1, wherein:
the phosphor portion comprises an inorganic material and a phosphor.
5. The light emitting device according to claim 4, wherein:
the phosphor portion comprises a thermal expansion coefficient greater than the sealing portion.
6. The light emitting device according to claim 1, wherein:
the phosphor portion comprises a dichroic mirror that a plurality of materials with different refractive indexes are alternately laminated, and a phosphor layer formed on the dichroic mirror.
7. The light emitting device according to claim 1, wherein:
the phosphor portion comprises a low-melting fluoride glass.
8. The light emitting device according to claim 1, wherein:
the optical-shaped portion comprises a dimension to define a ratio to a width of the light emitting element of 21/2 or more and 10 or less.
9. A light emitting device, comprising:
a light emitting element;
a substrate on which the light emitting element is mounted, the substrate comprising an inorganic material;
a sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material; and
a coating portion formed covering the sealing portion,
wherein the sealing portion comprises a cutting face at which an interface of the inorganic sealing material and the substrate is exposed and by which the light emitting element is surrounded, and
the sealing portion is covered with the coating portion on an entire surface thereof.
10. A light emitting device, comprising:
a light emitting element;
a substrate on which the light emitting element is mounted, the substrate comprising an inorganic material;
a sealing portion to seal the light emitting element, the sealing portion comprising an inorganic sealing material; and
a coating portion formed covering the sealing portion,
wherein the sealing portion comprises a cutting face by which the light emitting element is surrounded, and
the sealing portion is covered with the coating portion on an entire surface thereof that light emitted from the light emitting element reaches directly.
11. The light emitting device according to claim 9, wherein:
the light emitting element comprises a flip-mounting type light emitting element, and
the substrate comprises the inorganic material that comprises a thermal expansion coefficient equivalent to that of the sealing portion.
12. The light emitting device according to claim 9, wherein:
the coating portion comprises a light-transmitting inorganic material.
13. The light emitting device according to claim 9, wherein:
the coating portion comprises a phosphor-containing material.
14. The light emitting device according to claim 13, wherein:
the coating portion comprises a dichroic mirror.
15. A method of making a light emitting device, comprising:
a first step that a substrate comprising an inorganic material is provided;
a second stet that a plurality of light emitting elements are mounted on the substrate;
a third step that the substrate with the plurality of light emitting elements mounted thereon is sealed with a sealing material;
a fourth step that a cutting portion is provided in the sealing material;
a fifth step that a coating is formed on a surface of the sealing material including an exposed portion formed by providing the cutting portion; and
a sixth step that the substrate with the sealing material is separated along the cutting potion.
16. The method according to claim 15, wherein:
the coating in the fifth step is formed by sputtering.
17. The method according to claim 15, wherein:
the coating in the fifth step is formed by electrostatic coating.
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